Direct metal nano-imprinting using an embossed solid electrolyte stamp

Abstract

Abstract. In this paper, we report direct patterning of metal nanostructures using an embossed solid electrochemical stamp. Microforming of solid superionic stamps using Si templates-analogous to polymer patterning in nano-imprint lithography-is explored.Silver sulfide (Ag 2 S)-a superionic conductor with excellent micro-forming propertiesis investigated as a candidate material. Important parameters of the superionic stamp, including mechanical behavior, material flow during forming, and feature recovery after embossing are studied. Excellent feature transferability during embossing as well as etching is observed. To illustrate the capability of this approach silver nano-antennas with gaps <10 nm were successfully fabricated. The possibility for large area patterning with stamp diameters >6 mm is also demonstrated. Embossing based metal patterning allows fabrication beyond two-dimensional nanofabrication and several patterning schemes are reported.

Gas‐Permeable Cellulose Template for Reduction of Template Damage and Gas Trapping in Microimprint Lithography of High Volume Manufacturing

“…The Young's moduli of the TCGCT, silicon substrate, quartz plate, polymethyl methacrylate, and polyethylene were ≈1.6, 170, 72, 2.6, and 0.27 GPa, respectively. The Young's modulus of 1.6 GPa in the TCGCT was considered an industrially acceptable target; however, there is still room for improvement in the template formulation by increasing the concentration of cellulose …”

Nanoimprint technology for patterning functional materials and its applications

“…3). For example, the Ag 2 S was used as the stamp in which the silver ions were mobile [22,23]. Because the Ag 2 S demonstrated relatively low yield strength compared to that of Si, the Ag 2 S could be prepatterned with fine features by a Si mold.…”

Extreme-Pressure Imprint Lithography for Heat and Ultraviolet-Free Direct Patterning of Rigid Nanoscale Features

“…Besides, La’s group suggested a direct NIL method for milliscale (≥100 μm) metal patterning . However, despite the excellent patternability of these direct NIL approaches that realize the formation of functional multiscale (nanoto-microto-milli or nanomicro-to-macro) patterns, these approaches still have significant challenges related to their process complexity, such as the requirement of high-power radiation processes, electrical source, and/or large temperature change during process cycles …”

“…37 However, despite the excellent patternability of these direct NIL approaches that realize the formation of functional multiscale (nanoto-microto-milli or nanomicro-to-macro) patterns, these approaches still have significant challenges related to their process complexity, such as the requirement of high-power radiation processes, electrical source, and/or large temperature change during process cycles. 38 Here, we demonstrate a direct multiscale patterning method, extreme-pressure imprint lithography (EPIL), which is capable of producing periodic nanopattern geometries on metallic materials at room temperature, through nanoscopic plastic deformation of metal surfaces by extremely high pressure onto a hard Si nanomold. The thickness contrast or patterning depth in the metallic materials can be created by EPIL without the use of heat, UV light, electrical source, or a laser and also can be precisely controlled by only pressure and time.…”