Direct laser writing breaking diffraction barrier based on two-focus parallel peripheral-photoinhibition lithography

Zhu, Dan; Xu, Liang; Ding, Chenliang; Yang, Zhenyao; Qiu, Yiwei; Cao, Chun; He, Hongyang; Chen, Jiawei; Tang, Mengbo; Zhan, Lanxin; Zhang, Xiaoyi; Sun, Qiuyuan; Ma, Chengpeng; Wei, Zhen; Liu, Wenjie; Fu, Xiang; Kuang, Cuifang; Li, Haifeng; Liu, Xu

doi:10.1117/1.ap.4.6.066002

Cited by 16 publications

(8 citation statements)

References 51 publications

(83 reference statements)

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“…To enhance fabrication speed, various strategies have been developed, including galvo-mirror-based focus scanning, multifoci parallel processing, and structured light field techniques. These methods usually involve the utilization of auxiliary optical components, such as microlens arrays, beam-splitting devices, spatial light modulators, and digital micromirror devices [300][301][302][303][304][305]. Currently, the fabrication efficiency and processing quality of FsLDW are restricted by each other, limiting its large-scale and industrial practical applications.…”

Section: Discussionmentioning

confidence: 99%

Femtosecond laser direct writing of functional stimulus-responsive structures and applications

Zhang,

Wu,

Zhang

et al. 2023

Int. J. Extrem. Manuf.

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Diverse natural organisms possess stimulus-responsive structures to adapt to the surrounding environment. Inspired by nature, researchers have developed various smart stimulus-responsive structures with adjustable properties and functions to address the demands of ever-changing application environments that are becoming more intricate. Among many fabrication methods for stimulus-responsive structures, femtosecond laser direct writing (FsLDW) has received increasing attention because of its high precision, simplicity, true three-dimensional machining ability, and wide applicability to almost all materials. This paper systematically outlines state-of-the-art research on stimulus-responsive structures prepared by FsLDW. Based on the introduction of femtosecond laser-matter interaction and mainstream FsLDW-based manufacturing strategies, different stimulating factors that can trigger structural responses of prepared intelligent structures, such as magnetic field, light, temperature, pH, and humidity, are emphatically summarized. Various applications of functional structures with stimuli-responsive dynamic behaviors fabricated by FsLDW, as well as the present obstacles and forthcoming development opportunities, are discussed.

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Section: Discussionmentioning

confidence: 99%

Femtosecond laser direct writing of functional stimulus-responsive structures and applications

Zhang,

Wu,

Zhang

et al. 2023

Int. J. Extrem. Manuf.

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“…19 Typical structure sizes achieved so far are in the range of 50 nm both in the lateral 10,20,21 and axial direction. 4 Lateral feature sizes below 40 nm were reported recently, 15,22,23 but no improvements in axial feature sizes were attempted in these studies.…”

Section: Introductionmentioning

confidence: 93%

Low-Fluorescence Starter for Optical 3D Lithography of Sub-40 nm Structures

Gvindzhiliia

Sivun

Naderer

et al. 2023

ACS Appl. Opt. Mater.

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Stimulated emission depletion (STED) has been used to break the diffraction limit in fluorescence microscopy. Inspired by this success, similar methods were used to reduce the structure size in three-dimensional, subdiffractional optical lithography. So far, only a very limited number of radical polymerization starters proved to be suitable for STED-inspired lithography. In this contribution, we introduce the starter Michler’s ethyl ketone (MEK), which has not been used so far for STED-inspired lithography. In contrast to the commonly used 7-diethylamino-3-thenoylcoumarin (DETC), nanostructures written with MEK show low autofluorescence in the visible range. Therefore, MEK is promising for being used as a starter for protein or cell scaffolds in physiological research because the autofluorescence of DETC so far excluded the use of the green emission channel in multicolor fluorescence or confocal microscopy. In turn, because of the weak transitions of MEK in the visible spectrum, STED, in its original sense, cannot be applied to deplete MEK in the outer rim of the point spread function. However, a 660 nm laser can be used for depletion because this wavelength is well within the absorption spectrum of transient states, possibly of triplet states. We show that polymerization can be fully stopped by applying transient state absorption at 660 nm and that structure sizes down to approx. 40 nm in the lateral and axial directions can be achieved, which means 1/20 of the optical wavelength used for writing.

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“…With the shaping of laser beam, [740][741][742] optical elements with super smooth surface can be realized with grayscale lithography by modulating the intensity of laser for each voxel on the surface, avoiding slicing-induced defects. [267] The local control of beam intensity also provides a powerful tool to change the material properties such as the RI and the transmittance via polymerization ratio, thus introducing inhomogeneous and engineering the interaction between the structure and light.…”

Section: Challenges and Perspectivementioning

confidence: 99%

Two‐Photon Polymerization Lithography for Optics and Photonics: Fundamentals, Materials, Technologies, and Applications

Wang

Zhang

Ladika

et al. 2023

Adv Funct Materials

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The rapid development of additive manufacturing has fueled a revolution in various research fields and industrial applications. Among the myriad of advanced three-dimensional printing techniques, two-photon polymerization lithography (TPL) uniquely offers a significant electron microscope (SEM) images of SMP structures before and after programming and after recovery, respectively. Reproduced under terms of the CC-BY license. [114] Copyright 2021, The Authors, published by Nature Publishing Group. b) Stiff SMPs for high-resolution reversible nanophotonics. I-II) The deformed and recovered nanopillars under optical microscope and SEM, respectively. Reproduced with permission. [115] Copyright 2022, American Chemical Society. c) Vapor-responsive photonic arrays. I-IV) Optical image of a grid array in air, in water vapors ~ 20 s, saturation with water vapors ~ 88s, and after the gas flow stopped, respectively.Reproduced under terms of the CC-BY license. [116] Copyright 2021, The Authors, published by Royal Society of Chemistry. d) SEM image of a 40-layer face-cantered-cubic photonic structure printed by SU-8. Reproduced with permission. [117] Copyright 2004, Nature Publishing Group. e) SEM image of helices with an axial pitch of 800 nm and a radius of 800 nm fabricated by the two-step absorption photoresist. Reproduced with permission. [118]

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Direct laser writing breaking diffraction barrier based on two-focus parallel peripheral-photoinhibition lithography

Cited by 16 publications

References 51 publications

Femtosecond laser direct writing of functional stimulus-responsive structures and applications

Femtosecond laser direct writing of functional stimulus-responsive structures and applications

Low-Fluorescence Starter for Optical 3D Lithography of Sub-40 nm Structures

Two‐Photon Polymerization Lithography for Optics and Photonics: Fundamentals, Materials, Technologies, and Applications

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