Direct laser interference patterning of poly(3,4-ethylene dioxythiophene)-poly(styrene sulfonate) (PEDOT-PSS) thin films

Lasagni, Andrés Fabían; Hendricks, Jeffrey L.; Shaw, Charles M.; Yuan, Dajun; Martin, David C.; Das, Suman

doi:10.1016/j.apsusc.2009.06.130

Cited by 45 publications

(31 citation statements)

References 28 publications

(32 reference statements)

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“…The approximate 100 nm thickness means no molten material and minimal debris can be tolerated. For example, Lasagni et al patterned OLED layers using 355 nm nanosecond laser pulses, but found it extremely difficult to prevent removal of multiple OLED layers with a single pulse [8].…”

Section: Oled Laser Patterningmentioning

confidence: 98%

Advantages offered by high average power picosecond lasers

Moorhouse

2011

SPIE Proceedings

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As electronic devices shrink in size to reduce material costs, device size and weight, thinner material thicknesses are also utilized. Feature sizes are also decreasing, which is pushing manufacturers towards single step laser direct write process as an attractive alternative to conventional, multiple step photolithography processes by eliminating process steps and the cost of chemicals. The fragile nature of these thin materials makes them difficult to machine either mechanically or with conventional nanosecond pulsewidth, Diode Pumped Solids State (DPSS) lasers. Picosecond laser pulses can cut materials with reduced damage regions and selectively remove thin films due to the reduced thermal effects of the shorter pulsewidth. Also, the high repetition rate allows high speed processing for industrial applications. Selective removal of thin films for OLED patterning, silicon solar cells and flat panel displays is discussed, as well as laser cutting of transparent materials with low melting point such as Polyethylene Terephthalate (PET). For many of these thin film applications, where low pulse energy and high repetition rate are required, throughput can be increased by the use of a novel technique to using multiple beams from a single laser source is outlined.

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Section: Oled Laser Patterningmentioning

confidence: 98%

Advantages offered by high average power picosecond lasers

Moorhouse

2011

SPIE Proceedings

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“…The laser patterning of PEDOT:PSS has been recently reported by other research groups for organic device applications 9,10 . The substrate used in these cases was a non-flexible metallic layer.…”

Section: Introductionmentioning

confidence: 99%

Influence of barrier absorption properties on laser patterning thin organic films

Naithani

Mandamparambil

Assche

et al. 2012

Organic Photonics V

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This paper presents a study of selective ablation of thin organic films (LEP-Light Emitting Polymer, PEDOT:PSS-Poly 3,4-ethylenedioxythiophene: polystyrene sulfonate) by using 248 nm Excimer laser, on various kinds of multilayered SiN barrier foils for the development of Organic Light Emitting Diodes (OLED). Different Silicon Nitride (SiN) barrier foils with dedicated absorption spectra are taken into account for this purpose. The drive for looking into different types of SiN originates from the fact that the laser selective removal of a polymer without damage to the barrier layer underneath is challenging in the dynamic laser processing of thin films. The barrier is solely responsible for the proper encapsulation of the OLED stack. The main limitation of current OLED design is its shorter life span, which is directly related to the moisture or water permeation into the stack, leading to black spots. An optimization of laser parameters like fluence and number of shots has been carried out for the various types of SiN barrier foils. We are able to obtain a wider working process window for the selective removal of LEP and PEDOT:PSS from SiN barrier, by variation of the different types of SiN

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“…Many research works have investigated on the periodic interference patterns formed by nanosecond laser beams. But these studies were mainly concentrated on fabricating line-type structures by the interference of two laser beams, the beams is using the traditional beam delivery system with mirror beam splitters, and difficult to precise adjust [8][9][10].…”

Section: Introductionmentioning

confidence: 99%

Fabrication of microstructures on silicon by multiple beam holographic method using nanosecond laser pulses

2010

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Micron-sized grating structures (MGS) and sub-micron sized dot arrays (DA) were generated on silicon target by multiple shots of interfering nanosecond laser beams. The mechanism to form MGS and DA were analyzed and it is found that the obtained structures have a negative shape of the interference pattern. The most major size of the periodic structure is 500 nm. The optical properties of these nanostructures are also investigated. The silicon DAs function as both absorber and antireflection layers, which offer a promising approach to enhance the solar cell energy conversion efficiency.

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Direct laser interference patterning of poly(3,4-ethylene dioxythiophene)-poly(styrene sulfonate) (PEDOT-PSS) thin films

Cited by 45 publications

References 28 publications

Advantages offered by high average power picosecond lasers

Advantages offered by high average power picosecond lasers

Influence of barrier absorption properties on laser patterning thin organic films

Fabrication of microstructures on silicon by multiple beam holographic method using nanosecond laser pulses

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