Direct investigations of the electrical conductivity of normal and cancer breast cells by conductive atomic force microscopy

Zhao, Longfeng; Du, Xinyue; Fang, Bin; Liu, Qiyuan; Yang, Hui; Li, Fangzuo; Sheng, Yaohuan; Zeng, Xiangfu; Zhong, Haizhe; Zhao, Weidong

doi:10.1016/j.ultramic.2022.113531

Cited by 10 publications

(1 citation statement)

References 40 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Alternatively, current variation maps are acquired at a given applied voltage by scanning the AFM tip in contact mode across a defined sample surface area [5]. Owing to its versatility and high resolution in probing the local conductivity of materials, C-AFM has been extensively used in studying semiconductors [6,7], two-dimensional materials [8][9][10], memristive devices [11][12][13][14][15], photoelectric systems [16][17][18], dielectric films [19][20][21][22][23], molecular electronics [24][25][26][27][28][29], organic and biological systems [30][31][32][33][34], and quantum devices [35][36][37]. Various technical methods have been developed in C-AFM to cope with the diversity of its applications, including advanced sensors and lownoise preamplifiers [2,[38][39][40].…”

Section: Introductionmentioning

confidence: 99%

A multi-resistance wide-range calibration sample for conductive probe atomic force microscopy measurements

Piquemal,

Kaja,

Chrétien

et al. 2023

Beilstein J. Nanotechnol.

View full text Add to dashboard Cite

Measuring resistances at the nanoscale has attracted recent attention for developing microelectronic components, memory devices, molecular electronics, and two-dimensional materials. Despite the decisive contribution of scanning probe microscopy in imaging resistance and current variations, measurements have remained restricted to qualitative comparisons. Reference resistance calibration samples are key to advancing the research-to-manufacturing process of nanoscale devices and materials through calibrated, reliable, and comparable measurements. No such calibration reference samples have been proposed so far. In this work, we demonstrate the development of a multi-resistance reference sample for calibrating resistance measurements in conductive probe atomic force microscopy (C-AFM) covering the range from 100 Ω to 100 GΩ. We present a comprehensive protocol for in situ calibration of the whole measurement circuit encompassing the tip, the current sensing device, and the system controller. Furthermore, we show that our developed resistance reference enables the calibration of C-AFM with a combined relative uncertainty (given at one standard deviation) lower than 2.5% over an extended range from 10 kΩ to 100 GΩ and lower than 1% for a reduced range from 1 MΩ to 50 GΩ. Our findings break through the long-standing bottleneck in C-AFM measurements, providing a universal means for adopting calibrated resistance measurements at the nanoscale in the industrial and academic research and development sectors.

show abstract