2013
DOI: 10.1088/0268-1242/28/9/094004
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Direct growth of III–V quantum dots on silicon substrates: structural and optical properties

Abstract: This paper reports the recent progress obtained by direct growth of III-V semiconductor quantum dots (QDs) on flat and prepatterned silicon substrates. For the flat surfaces, we discuss the basic growth studies addressing mainly morphological and structural properties of QD-like structures using transmission electron microscopy. For the growth on prepatterned substrates, we report on the optimization of the electron beam lithography process to fabricate sub-100 nm holes in silicon and the MBE growth on prepatt… Show more

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Cited by 16 publications
(11 citation statements)
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“…[4][5][6][7] As the full integration of LOQC on a single chip requires the on-chip generation of single photons, the implementation of ondemand single quantum emitters on silicon is an ongoing research topic. [8][9][10] There have also been several attempts to use probabilistic schemes like spontaneous four-wave mixing. 11,12 Another approach is the transition to the III-V semiconductor platform, where efficient guiding of single photons in WGs has already been shown.…”
mentioning
confidence: 99%
“…[4][5][6][7] As the full integration of LOQC on a single chip requires the on-chip generation of single photons, the implementation of ondemand single quantum emitters on silicon is an ongoing research topic. [8][9][10] There have also been several attempts to use probabilistic schemes like spontaneous four-wave mixing. 11,12 Another approach is the transition to the III-V semiconductor platform, where efficient guiding of single photons in WGs has already been shown.…”
mentioning
confidence: 99%
“…By depositing several monolayers of semiconductors with a strong lattice mismatch, epitaxial growth can be initiated in a layer-by-layer fashion and to coherently grow 3D islands (Figure 10(a)–(f)) [50]. …”
Section: Quantum Dots: Properties and Synthesismentioning
confidence: 99%
“…Due to this large potential, there is a great interest for the integration of III-V compound semiconductors into Si technology. This integration can be performed by several techniques, where molecular beam epitaxy [12][13][14], metal-organic vapor phase epitaxy [15][16][17] and wafer bonding [18,19] are the most prominent ones. Another approach is ion beam synthesis of III-V crystallites within the Si host material [20,21] using sequential ion beam implantation and thermal annealing [22,23].…”
Section: Introductionmentioning
confidence: 99%