1987
DOI: 10.1002/pssa.2211010210
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Diffusion processes in lightguide materials. The diffusion of OH in silica glass at high temperatures

Abstract: The OH diffusion in silica glass is investigated between 1500 and 2300°C. Specimens are prepared by deposition of silica glass layers on the inner surface of tubes made of silica glass with different OH content. The diffusion from the tube and from the gas phase within the tube, respectively, into the layers during annealing is studied by measuring the laser beam absorption at 2.73 (J.m wavelength with a high spatial resolution. By fitting the measured radial OH profiles to calculated diffusion distributions, … Show more

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Cited by 17 publications
(3 citation statements)
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“…The diffusion in the inner tube layers can be considered as purely radial, but we have to allow for the strong concentration dependence of the diffusion coefficient as well as for the change of r i in the case of the collapsing steps. The shape of the diffusion equation within a radially collapsing medium has been derived in [14] and together with the concentration dependence of the diffusion coefficient we get a formulation which is used troughout our model.…”
Section: Modeling Of Phosphorus Diffusion During Mcvd Deposition and mentioning
confidence: 99%
“…The diffusion in the inner tube layers can be considered as purely radial, but we have to allow for the strong concentration dependence of the diffusion coefficient as well as for the change of r i in the case of the collapsing steps. The shape of the diffusion equation within a radially collapsing medium has been derived in [14] and together with the concentration dependence of the diffusion coefficient we get a formulation which is used troughout our model.…”
Section: Modeling Of Phosphorus Diffusion During Mcvd Deposition and mentioning
confidence: 99%
“…At first, layers of pure SiO 2 were deposited on the inner surface of commercial quartz glass tubes with different OH contents according to Table 1. Diffusion effects on the OH concentration profile by the collapsing process are negligible [2]. Then sections of a length of 8 cm were cut from the middle of each tube and placed in a furnace, where they were heated to 420 °C in laboratory air for 5 weeks.…”
Section: Journal Of Optical Communkationsmentioning
confidence: 99%
“…Above this temperature the effective diffusion coefficients were similar to earlier results with an activation energy of about 80kJ/mol. For the high temperature range it was shown [2] that an initial OH profile in silica glass created by the manufacturing process changes during heat treatment with a diffusion coefficient D, which is comparable to the effective diffusion coefficient of OH for the diffusion of water. For the high temperature range it was shown [2] that an initial OH profile in silica glass created by the manufacturing process changes during heat treatment with a diffusion coefficient D, which is comparable to the effective diffusion coefficient of OH for the diffusion of water.…”
Section: Introductionmentioning
confidence: 99%