2006
DOI: 10.1134/s1063782606060029
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Diffusion of terbium in silicon

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Cited by 2 publications
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“…No concentration quenching effect is observed in the Si/Tb thin films till 20 at% of Tb content, which is the maximum RE content obtained by the current electrodeposition technique. The absence of concentration quenching phenomena in Si/Tb deposits could be due to the high penetration depth of Tb in Si 64 and also to the high degree of oxidation of Tb in the deposit. It is reported that the presence of oxygen helps to reduce the segregation of RE in Si and makes the incorporation of it easier by forming RE–O complexes.…”
Section: Resultsmentioning
confidence: 99%
“…No concentration quenching effect is observed in the Si/Tb thin films till 20 at% of Tb content, which is the maximum RE content obtained by the current electrodeposition technique. The absence of concentration quenching phenomena in Si/Tb deposits could be due to the high penetration depth of Tb in Si 64 and also to the high degree of oxidation of Tb in the deposit. It is reported that the presence of oxygen helps to reduce the segregation of RE in Si and makes the incorporation of it easier by forming RE–O complexes.…”
Section: Resultsmentioning
confidence: 99%
“…P. Berger, V. Bojko, G. Vaŝenko, K. Galuško, V. Kravec, I. Kon, T. Lukman, Dž.-G Mid, D. Miller, A. Nazyrov, È Èrikson i in.). W szczególności t o ż s a m o ś ć określają oni jako: -osobiste odczucie, organizujące motywy, umiejętności i działania w jeden system (А. Nazyrov) 24 ; -proces organizowania doświadczeń życiowych w indywidualne Ja jako złożona forma osobista, która posiada strukturę warstwową (È. Èrikson) 25 ; -element kluczowy rzeczywistości subiektywnej, który znajduje się w dialektycznym związku ze społeczeństwem i kształtuje się poprzez procesy społeczne (P. Berger, T. Lukman) 26 . Do form jej istnienia -na poziomie indywidualnego doświadczenia -Èrikson zalicza następujące elementy tożsamości:…”
Section: Wyniki Badańunclassified