Single step electrodeposition process using ionic liquid to grow highly luminescent silicon/rare earth (Er, Tb) thin films with tunable composition

Abstract

A one-step method for the electrodeposition of silicon–erbium (Si/Er) and silicon–terbium (Si/Tb) thin films using room temperature ionic liquid (RTIL) has been successfully developed.

Growth of Homogeneous Luminescent Silicon–Terbium Nanowires by One-Step Electrodeposition in Ionic Liquids

“…First, the electrochemical behavior of individual precursors, i.e., SiCl 4 and TbCl 3 , in Py 1,4 [TFSI] was studied by performing their CVs to evidence the possible deposition of the metallic species, and then, an electrolyte solution containing a mixture of these two precursors was analyzed to study the electrochemical feasibility of co-depositing Si and Tb simultaneously. The red and blue curves in Figure 2 [TFSI] are described in our recent reports [31,32], which proves the possibility of depositing Si and Tb in their elemental form. An electrolyte solution containing a mixture of these two precursors was then analyzed by CV.…”

“…Electrodeposition of amorphous Si NWs and nanotubes from ILs has been previously reported by our group [26][27][28] and others [29,30]. However, the possibility of co-depositing Tb with Si to achieve Si/Tb NWs have not been investigated although we developed a method to incorporate RE within Si thin films [31]. Herein, we demonstrate a one-step template-assisted electrodeposition technique using ILs for the growth of Si/Tb NWs with a diameter of 90 nm.…”

“…50 °C. Details on the electrochemistry of individual precursors in Py1,4[TFSI] are described in our recent reports [31,32], which proves the possibility of depositing Si and Tb in their elemental form.…”

“…It is evident from the CV studies that Si and Tb could be co-deposited as NWs by applying an appropriate potential in Py1 50 °C. Details on the electrochemistry of individual precursors in Py1,4[TFSI] are described in our recent reports [31,32], which proves the possibility of depositing Si and Tb in their elemental form.…”

Electrodeposition of cadmium selenide based photoanodes from TOMAC/Formamide ionic liquid for photoelectrochemical applications

“…This phenomenon has a deep effect not only on photocurrent e ciency but also on the nal quality of deposited metals. Thus, RTILs were considered as appropriate alternative electrolytes for the electrodeposition of several metals and semi-conductor materials thanks to their intrinsic physico-chemical properties [20][21][22][23]. Using an eutectic mixture Dale et al [24] has deposited CdSe lms from a commercially urea and choline chloride.…”