2022
DOI: 10.1016/j.jma.2020.12.013
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Different role of second phase in the micro-galvanic corrosion of WE43 Mg alloy in NaCl and Na2SO4 solution

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Cited by 42 publications
(7 citation statements)
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“…R f represents the film resistance, and Q f is the film capacitance. R L and L describe the low-frequency inductive loop, which corresponds to corrosion nucleation of localized corrosion [ 34 ]. Localized corrosion can be observed in Figure 7 e. According to the fitting results in Table 2 , extruded WE43 alloys showed higher R t and R f values, indicating a slower dissolution rate and better film protection.…”
Section: Resultsmentioning
confidence: 99%
“…R f represents the film resistance, and Q f is the film capacitance. R L and L describe the low-frequency inductive loop, which corresponds to corrosion nucleation of localized corrosion [ 34 ]. Localized corrosion can be observed in Figure 7 e. According to the fitting results in Table 2 , extruded WE43 alloys showed higher R t and R f values, indicating a slower dissolution rate and better film protection.…”
Section: Resultsmentioning
confidence: 99%
“…This phenomenon is attributed to Cl − being more corrosive than SO 4 2− [ 31 ]. The WE43 alloy in these two solutions showed a different result, which is interesting [ 4 ].…”
Section: Resultsmentioning
confidence: 99%
“…Magnesium alloys have attracted special interest in many fields for their light weight, high specific strength, and great biodegradability [ 1 , 2 ]. They have considerable potential for application in transportation, aerospace, electronic technology, and especially biomedicine [ 3 , 4 , 5 ]. Magnesium alloys have a similar density to human bones and good biocompatibility to be used as human implant materials, which is why they are known as revolutionary metal materials [ 6 , 7 , 8 , 9 , 10 ].…”
Section: Introductionmentioning
confidence: 99%
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“…SKPFM является мощным инструментом для изучения слабого взаимодействия атомов на поверхности исследуемого сплава, которое отражает поверхностный потенциал образца в корреляции с морфологией его поверхности [44,[471][472][473][485][486][487][488][489][490][491][492][493].…”
Section: анализ распределения локального вольта-потенциалаunclassified