2020
DOI: 10.1021/acsaelm.0c00051
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Dielectric Surface Charge Engineering for Electrostatic Doping of Graphene

Abstract: Controlling the doping level in graphene during integration into silicon CMOS compatible devices is an open challenge. In general, the doping level in graphene is influenced via substrate interactions, metal contacts, and encapsulation layers. Here, we demonstrate a method to control the Fermi level in graphene through transfer onto ionic-doped oxide surfaces. The substrates were prepared to this end by diffusion of ammonia and aluminum on the oxide surface, which induces positive (NSiO+) and negative (AlSiO–)… Show more

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Cited by 15 publications
(18 citation statements)
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“…[ 57 ] Therefore, it is important to fabricate high quality graphene to lower R SK and thus to reduce R CF . [ 58 ] Also selecting the metal materials that increase n 0 in the underneath graphene would improve R SK and hence R CF .…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…[ 57 ] Therefore, it is important to fabricate high quality graphene to lower R SK and thus to reduce R CF . [ 58 ] Also selecting the metal materials that increase n 0 in the underneath graphene would improve R SK and hence R CF .…”
Section: Resultsmentioning
confidence: 99%
“…In the case of graphene, n0 typically varies between 10 11 and 10 13 cm -2 , therefore RCF is intrinsically dependent on the RSK of graphene under the metal contact [57]. Therefore, it is important to fabricate high quality graphene to lower RSK and thus to reduce RCF [58]. Also selecting the metal materials that increase n0 in the underneath graphene would improve RSK and hence RCF.…”
Section: Resultsmentioning
confidence: 99%
“…The Silicon nitride, , dielectric layer causes an effective n-type doping in graphene sheet 34 , 35 . The shift in Fermi energy is given by where is the Fermi velocity ( for graphene), is Planck’s constant, and n is the carrier density.…”
Section: Appendixmentioning
confidence: 99%
“…However, the native oxide layer can be present at the graphene and silicon interface because silicon surface reoxidation after direct graphene synthesis was reported in [ 62 ]. Graphene placed on the silicon dioxide can be electron-doped due to the positive silanol groups on the SiO 2 surface [ 97 , 98 ].…”
Section: Discussionmentioning
confidence: 99%