Abstract:ZrTiO 4 is a small ceramic constituent material which has very good thermal and electrical properties. ZrTiO 4 thin films were deposited by reactive dc magnetron co-sputtering method. The crystal structure, surface morphology, thickness and dielectric properties were characterized by XRD (X-ray diffraction), AFM (atomic force microscopy), FE-SEM (field emission scanning electron microscope), and precision impedance analyzer respectively. These films were crystallization of the orthorhombic phase (111) of ZrTiO… Show more
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