Technical Digest., International Electron Devices Meeting
DOI: 10.1109/iedm.1988.32929
|View full text |Cite
|
Sign up to set email alerts
|

Dielectric based antifuse for logic and memory ICs

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4
1

Citation Types

0
23
0

Publication Types

Select...
6
2
2

Relationship

0
10

Authors

Journals

citations
Cited by 71 publications
(23 citation statements)
references
References 1 publication
0
23
0
Order By: Relevance
“…Conventionally, most of the OTP is fabricated using either special process which requires additional masks in addition to the standard CMOS process available form common foundries [1]. Some high density OTP structures are not CMOS compatible in order to achieve very compact structure [2].…”
Section: Introductionmentioning
confidence: 99%
“…Conventionally, most of the OTP is fabricated using either special process which requires additional masks in addition to the standard CMOS process available form common foundries [1]. Some high density OTP structures are not CMOS compatible in order to achieve very compact structure [2].…”
Section: Introductionmentioning
confidence: 99%
“…They can be an oxide-nitride-oxide (ONO) layer sandwiched between diffusion and polysilicon [16], or between two layers of polysilicon [17], or a metal-insulator-metal (MIM) stack [18], or gate oxide itself [19]. These technologies are typical of low-density and slow programming.…”
Section: Introductionmentioning
confidence: 99%
“…Two approaches have been used to implement anti-fuses. Dielectric anti-fuses are composed of an oxide-nitride-oxide dielectric positioned between N+ diffusion and polysilicon [93]. The application of a high voltage causes the dielectric to break down and form a conductive link with a resistance of typically between 100 and 600 ohms [55,90].…”
Section: Anti-fuse Programming Technologymentioning
confidence: 99%