2005
DOI: 10.1016/j.jcrysgro.2005.07.017
|View full text |Cite
|
Sign up to set email alerts
|

Dielectric and piezoelectric properties of highly (100)-oriented BaTiO3 thin film grown on a Pt/TiOx/SiO2/Si substrate using LaNiO3 as a buffer layer

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

5
50
0

Year Published

2010
2010
2016
2016

Publication Types

Select...
7
2
1

Relationship

0
10

Authors

Journals

citations
Cited by 87 publications
(55 citation statements)
references
References 20 publications
5
50
0
Order By: Relevance
“…As schematically shown in Figure 2a, the PFM technique was used to measure the piezoelectric constant, d 33 (the induced polarization per unit stress applied in an out-of-plane direction), of the BaTiO 3 thin films on Si substrates. Figure 2b 23,24 and verifies that our process was well optimized. Figure 3a-i,ii shows schematics of the appearance and cross-sectional structure of the poled BaTiO 3 nanogenerator in its original state without bending.…”
supporting
confidence: 54%
“…As schematically shown in Figure 2a, the PFM technique was used to measure the piezoelectric constant, d 33 (the induced polarization per unit stress applied in an out-of-plane direction), of the BaTiO 3 thin films on Si substrates. Figure 2b 23,24 and verifies that our process was well optimized. Figure 3a-i,ii shows schematics of the appearance and cross-sectional structure of the poled BaTiO 3 nanogenerator in its original state without bending.…”
supporting
confidence: 54%
“…7 Different top and bottom electrodes used in the fabrication of MFIS structure are responsible for the asymmetry observed in the C-V characteristics. 11 In addition, counterclockwise direction of the arrows (indicated in the figures) confirms that, the observed hysteresis behavior is induced by the ferroelectric polarization. 12 It is that, capacitance of the MFIS structure with ZnO channel is lower as compared to that with Al: ZnO channel.…”
Section: Resultssupporting
confidence: 70%
“…The grain size is increased with increasing the annealing temperatures, changing from 14 to 55 nm in diameter. It is noted that the BTO films in this work exhibit much smaller grain sizes as compared to other reported BTO films [42,43]. The difference is considered to be the result of the influence of microstructure of the LNO buffer layer.…”
Section: Grain Size Effectmentioning
confidence: 57%