Die Massenspektren der Verbindungen (CH3)nSi(OCH3)4‐n (n = 0–3)

Dube, G.

doi:10.1002/zfch.19680080928

Zeitschrift fuer Chemie

1968

DOI: 10.1002/zfch.19680080928

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Die Massenspektren der Verbindungen (CH₃)_nSi(OCH₃)₄‐_n (n = 0–3)

G. Dube¹

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Mass Spectrometric Study of Some Si‐N Compounds (CH₃)_4‐n Si{N(CH₃)₂}_n (N = 1‐4)

Naessens

Claeys

Kelen

1982

Bulletin des Soc Chimique

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The mass spectra of the various methyl dimethylaminosilanes were studied and the fragmentation processes are discussed. Characteristic features of the mass spectra of these compounds are : (i) the breaking of the Si-N bond occurs more readily than that of the Si-C bond (ii) the abundant molecular ions decompose preferably by loss of radicals : CH3', N(CH3)Z' and H. (iii) the most likely fragmentation process for the base peak ion consists of elimination of neutral N containing molecules and occurs simultaneously with H or CH3 shift.

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Mass Spectrometric Study of Some Si‐N Compounds (CH₃)_4‐n Si{N(CH₃)₂}_n (N = 1‐4)

Naessens

Claeys

Kelen

1982

Bulletin des Soc Chimique

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Metastable ion studies: Ethyl(methoxy)(chloro)silanes

Hagen¹,

Hodge²,

Randolph³

et al. 1994

Org. Mass Spectrom.

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Metastable ion scanning was used to investigate the fragmentation patterns of ethyl(trimethoxy)silane, ethyl(dimethoxy)chlorosilane and ethyl(methoxy)dichlorosilane, their deuterated counterparts and ethyltrichlorosilane. For these compounds the molecule ion has a low abundance using 70 eV electron impact ionization. In all cases the base peak corresponds to the loss of neutral C,H,. When chemical ionization is employed with isobutane, usable peaks representative of the molecule ions are observed.

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Der elektronenstoßinduzierte Abbau von Tetraalkoxysilanen

Dube

1971

J. Prakt. Chem.

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Die Zerfallsreaktionen der Tetraalkoxysilane Si[O(CH2)nCH3]4 (n = 0–4) und Si[O(CH2)nCH(CH3)2]4 (n = 0, 1, 2) bei Elektronenstoß in der Ionenquelle des Massenspektrometers werden wiedergegeben. Sie bestehen im Abbau der primär durch Fragmentierung aus dem Molekülionen gebildeten Ionen (Alkyl‐O‐)3Si+ und (Alkyl‐O‐)3SiOCH2+. Diese Abbaureaktionen sind Folgen von Wasserstoffumlagerungen, in deren Verlauf Aldehyd‐ und Olefinabspaltungen miteinander konkurrieren. Im allgemeinen überwiegt die Olefinabspaltung. Die Besonderheiten dieser Reaktionen bei der Fragmentierung der verschiedenen Tetraalkoxysilane werden diskutiert.

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Die Massenspektren der Verbindungen (CH₃)_nSi(OCH₃)₄‐_n (n = 0–3)

Cited by 9 publications

References 0 publications

Mass Spectrometric Study of Some Si‐N Compounds (CH₃)_4‐n Si{N(CH₃)₂}_n (N = 1‐4)

Mass Spectrometric Study of Some Si‐N Compounds (CH₃)_4‐n Si{N(CH₃)₂}_n (N = 1‐4)

Metastable ion studies: Ethyl(methoxy)(chloro)silanes

Der elektronenstoßinduzierte Abbau von Tetraalkoxysilanen

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Die Massenspektren der Verbindungen (CH3)nSi(OCH3)4‐n (n = 0–3)

Cited by 9 publications

References 0 publications

Mass Spectrometric Study of Some Si‐N Compounds (CH3)4‐n Si{N(CH3)2}n (N = 1‐4)

Mass Spectrometric Study of Some Si‐N Compounds (CH3)4‐n Si{N(CH3)2}n (N = 1‐4)

Metastable ion studies: Ethyl(methoxy)(chloro)silanes

Der elektronenstoßinduzierte Abbau von Tetraalkoxysilanen

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Product

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About

Die Massenspektren der Verbindungen (CH₃)_nSi(OCH₃)₄‐_n (n = 0–3)

Mass Spectrometric Study of Some Si‐N Compounds (CH₃)_4‐n Si{N(CH₃)₂}_n (N = 1‐4)

Mass Spectrometric Study of Some Si‐N Compounds (CH₃)_4‐n Si{N(CH₃)₂}_n (N = 1‐4)