which allows for the use of standard digital electronics compatible measurement set up, ultimately allowing for a device with higher degree of integration. This synthesis strategy avoids complex synthesis routes such as doping and increases carrier concentration upon UV exposure, toward enhanced sensitivity under standard temperature and pressure.As a substrate for the ZnO-based imaging sensor, we chose commercially available copper-cladded polyimide, owing to its high temperature and chemical stability. The copper thin fi lm layer is defi ned as the electrode using standard lithography technique and wet etching. This layer forms the base of the sensor, as shown in Figure 1 a. The robust copper layer enables the facile interfacing of the sensor as well as integration with existing technology through well-established techniques such as soldering. Furthermore, thin metal fi lms have been proven to adhere well to polyimide fi lms permitting operation in strained states. [ 17,18 ] To isolate the electrode layer from the bridge that connects the individual electrodes, we use photopatternable spin-on polyimide as a thin fi lm isolation layer as seen in Figure 1 a. To connect the now-isolated individual electrodes with the interfacing pad, we use an electron beam evaporated gold thin fi lm (250 nm with 100 nm chromium adhesion layer) that offers high electrical conductivity with low fi lm thicknesses. This so-called bridge is formed by standard photolithography (Figure 1 a,b). The sensing elements are then synthesised on top of the copper electrodes. The sensing elements comprise of oxygen-defi cient ZnO deposited by reactive magnetron sputtering. The sensing elements (referred to as pixels) are patterned by standard photolithography methods and wet etching. Detailed information on the fabrication process can be found in the Experimental Section.The resulting device is 30 µm thick and highly fl exible (Figure 1 c), which will be quantifi ed later in the manuscript. It comprises of 256 pixels spread over 57 × 89 µm with a 2.6 mm pitch. In order to ascertain the composition of the ZnO fi lm, we characterised the atomic concentrations of the zinc and oxygen via X-ray photoelectron spectroscopy (XPS). It can be seen in Figure 2 a that the as-synthesized fi lm has a uniform oxygen defi ciency profi le throughout the fi lm thickness, furthermore we show a comparison with a stoichiometric fi lm in the Supporting Information ( Figure S1, Supporting Information). Furthermore, the as-deposited fi lms are preferentially (002) oriented as confi rmed by X-ray diffraction ( Figure S2, Supporting Information).To validate the suitability of the oxygen-defi cient ZnO, we characterised the optical response of a single pixel in detail. In order to analyse the response of a single pixel to UV exposure, the sample was irradiated with UV light using a 365 nm light emitting diode (LED). A strong decrease in resistance can be observed (Figure 2 b) under UV exposure. It is also observed Ultraviolet (UV) imaging instruments have demanding requir...