Diamond synthesis by plasma chemical vapor deposition in liquid and gas

Toyota, Hiromichi; Nomura, Shinhuku; Mukasa, Shinobu; Takahashi, Yoshiyuki; Okuda, Sachio

doi:10.1016/j.diamond.2009.12.018

Cited by 13 publications

(4 citation statements)

References 11 publications

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“…A search for new deposition routes exists but the deposition area limitation remains. 2,3) An alternative approach to such systems, namely, microwave surface wave plasma utilizing linear antenna(s) or slot window(s), has become an attractive CVD method for the growth of carbon allotropes over large areas (>100 cm 2 ). [4][5][6][7][8] These plasma systems have already proved their potential in the preparation of various functional materials under specific equilibrium plasma conditions.…”

Section: Introductionmentioning

confidence: 99%

Growth of carbon allotropes and plasma characterization in linear antenna microwave plasma CVD system

Potocký¹,

Babchenko²,

Davydova³

et al. 2014

Jpn. J. Appl. Phys.

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Growth of diamond coatings with tunable morphology and concurrent substrate catalyst pretreatment and further growth of carbon nanotubes were studied. The dependence of plasma parameters on gas composition was studied by Langmuir probe measurement. Grown diamond coatings and carbon nanotubes were characterized by scanning electron microscopy and Raman spectroscopy and correlated with process parameters. Welldefined nanocrystalline, polycrystalline, and porous diamond films were prepared. Concurrent substrate catalyst pretreatment and further growth of carbon nanotubes were shown.

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Section: Introductionmentioning

confidence: 99%

Growth of carbon allotropes and plasma characterization in linear antenna microwave plasma CVD system

Potocký¹,

Babchenko²,

Davydova³

et al. 2014

Jpn. J. Appl. Phys.

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“…There is much anticipation for this new process. Generating plasmas in organic solvents disposes of waste liquids, creates flammable gases [5][6][7], and enables the synthesis of diamonds and SiC [8][9][10]. While this indicates that technologies applying in-liquid plasmas are rapidly evolving, there still are many areas that remain unclear, such as the discharge characteristics in the plasma, the formation of the plasma and the pathways of the chemical reactions.…”

Section: Introductionmentioning

confidence: 99%

Characteristics of in-liquid plasma in water under higher pressure than atmospheric pressure

Nomura

Mukasa

Toyota

et al. 2011

Plasma Sources Sci. Technol.

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The excitation temperature, electron density, temperature of OH, and behavior of bubbles generated by a 27.12 MHz in-liquid plasma are investigated in water under pressures ranging from 0.1 to 0.4 MPa. The excitation temperature decreases as the pressure increases and, conversely, the temperature of OH and the electron density increase. Since the plasma can be generated stably even under high-pressure conditions and the liquid provides a cooling effect, the electrode is not damaged by the heat. The bubbles generated from the tip of the electrode have a fixed relationship between their diameter and departure frequency. The in-liquid plasma can be stably generated even under high pressures and it maintains a high superheated state of a few thousand K. A boiling phenomenon in the in-liquid plasma uses the plasma itself as a heat source.

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“…High-performance cutting tools are manufactured by coating the surfaces of the tools with diamond film [1][2][3][4][5]. Here, chemical vapor deposition (CVD) is a well-established method for diamond film coating [6][7][8][9][10]. However, direct deposition of diamond on a steel surface has been considered impossible for two reasons [11][12][13][14]:…”

Section: Introductionmentioning

confidence: 99%

Effect of Mechanically Created Pits Pattern for Direct Diamond Deposition on Stainless-Steel Surface

Shiraishi,

Toyota,

Goto

et al. 2023

SSP

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Direct diamond deposition on a steel surface has been considered very difficult. Recently, we found that high-quality diamond films can be deposited on the surface of stainless-steel X5CrNi 18-10 by drilling multiple regularly arranged pits without interlayers or seeding. The following two hypotheses (A) and (B) can be considered as the reason why a high-quality diamond film can be deposited: (A) unoxidized Cr and Ni exposed to the stainless-steel X5CrNi 18-10 surface prevent carbon diffusion into interior of the stainless-steel, resulting diamond core generation, (B) Surface geometry with regular roughness contributes to stress relaxation and delamination prevention. In the present study, those hypotheses have been examined by quantum chemistry calculation and experimental. For the quantum chemistry calculation, energy barrier and kinetic energy for a carbon atom intrudes into a model cluster has been calculated with an ab-initio computational chemistry software package, Gaussian. The calculation result has supported hypothesis (A). For the experiment, X5CrNi 18-10 stainless-steel substrates with different surface characteristics are prepared by using various mechanical machining methods and used in the direct deposition process for diamond with in-liquid plasma CVD. The experimental result has supported both hypothesis (A) and (B).

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Diamond synthesis by plasma chemical vapor deposition in liquid and gas

Cited by 13 publications

References 11 publications

Growth of carbon allotropes and plasma characterization in linear antenna microwave plasma CVD system

Growth of carbon allotropes and plasma characterization in linear antenna microwave plasma CVD system

Characteristics of in-liquid plasma in water under higher pressure than atmospheric pressure

Effect of Mechanically Created Pits Pattern for Direct Diamond Deposition on Stainless-Steel Surface

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