Diamond Particles Deposited among Nickel/Copper Particles in Energy Controlled CH<sub>4</sub>/H<sub>2</sub> RF Discharge Plasmas

Abstract

Formation of diamond particles was investigated in an energy-controlled CH 4 /H 2 radio-frequency (RF) discharge plasma. Here, in particular, it was examined how diamond particles grew on a nickel substrate under an influence of Cu vapor that was supplied from a heated Cu wire. Here, the plasma was generated by a hollow-magnetron-type (HMT) RF plasma source at the frequency of 13.56 MHz. Total pressure was kept at 100 mTorr. Diamond particles grew besides Ni and Cu particles. From Raman spectrum the substrate surface was covered with thin graphite film deposited as a background layer. It was shown that diamond could grow in a self-organized manner even when the other atomic gas species such as Ni and Cu were contained in the gas at the same time during the growth process.

Self-Assembled Pillar-like Structures in Nanodiamond Layers by Pulsed Spray Technique

“…23 Diamond particles ranging from micro-to nanoscale can also be deposited on substrates using different techniques. Emi and Iizuka 24 produced diamond particles among nickel/copper particles using CH 4 /H 2 radiofrequency plasmas. Grudinkin et al 25 fabricated isolated spherical diamond particles "on synthetic opal" including Si-V color centers by means of CVD.…”