1993
DOI: 10.1016/0925-9635(93)90168-2
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Diamond membranes with controlled stress for submicron lithography

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Cited by 19 publications
(9 citation statements)
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“…Other early important papers characterized the intrinsic stress of the material, [13,[20][21][22] and demonstrated low temperature and pressure deposition conditions. [23][24][25][26] As will be discussed later, these NCD materials were all grown in hydrogen-rich CVD environments, with typically less than 2% methane (or hydrocarbon) in hydrogen as reactants.…”
Section: Historical Overviewmentioning
confidence: 99%
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“…Other early important papers characterized the intrinsic stress of the material, [13,[20][21][22] and demonstrated low temperature and pressure deposition conditions. [23][24][25][26] As will be discussed later, these NCD materials were all grown in hydrogen-rich CVD environments, with typically less than 2% methane (or hydrocarbon) in hydrogen as reactants.…”
Section: Historical Overviewmentioning
confidence: 99%
“…NCD films exhibit a continuous variation in material properties and defect concentrations which depend on the growth methods, reactant species, substrate temperature, and reactor pressure. The methods include plasma-enhanced (PE)CVD (microwave, [9,12,[14][15][16]20,21,78,84,85] electron cyclotron resonance, [23][24][25] DC glow discharge, [86,87] and hot filament-assisted CVD. [88][89][90][91][92] In Table 1 several subclasses of NCD were identified based on the use of higher methane concentrations (1-4% CH 4 in H 2 ), [74] biased plasma (energetic ion flux), [77,78] nitrogen addition, [82,93] and very low CH 4 concentrations (0.1 to 0.5% CH 4 in H 2 ).…”
Section: Historical Overviewmentioning
confidence: 99%
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“…One of the first applications of NCD films was as support membranes for absorber patterns in Xray photolithography and X-ray transmission windows [133,135]. More recently, they have been incorporated into silicon on insulator (SOI) wafers [157,158].…”
Section: Ncd and Uncd Applicationsmentioning
confidence: 99%
“…NCD films can be deposited by different methods, such as MPCVD [132][133][134][135][136][137], Electron…”
Section: Ncd Film Growthmentioning
confidence: 99%