2010
DOI: 10.1088/0022-3727/43/37/374017
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Diamond growth by chemical vapour deposition

Abstract: This paper reviews the growth of diamond by chemical vapour deposition (CVD). It includes the following seven parts: (1) Properties of diamond: this part briefly introduces the unique properties of diamond and their origin and lists some of the most common diamond applications. (2) Growth of diamond by CVD: this part reviews the history and the methods of growing CVD diamond. (3) Mechanisms of CVD diamond growth: this part discusses the current understanding on the growth of metastable diamond from the vapour … Show more

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Cited by 244 publications
(161 citation statements)
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“…32 The oxidization and subsequent removal of sp 2 -bonded carbon structures, present either in amorphous or graphitic forms, is achieved by the use of liquid oxidizers such as sodium peroxide, a chromium trioxide and sulfuric acid mixture, or a nitric acid and hydrogen peroxide mixture. 31 Thermal oxidation process uses temperatures of 400°C-430°C to allow the oxidation of sp 2 -bonded carbon species in the air, with negligible alteration in sp 3 -bonded carbon structures. 33 These temperature requirements for the selective oxidation of sp 2 -bonded carbon species were confirmed by Pichot et al 32 The oxidation of NDs at a high temperature using air containing ozone is another approach that results in the removal of the majority of sp 2 -hybridized carbon structures.…”
Section: Temperature T (°C)mentioning
confidence: 99%
See 1 more Smart Citation
“…32 The oxidization and subsequent removal of sp 2 -bonded carbon structures, present either in amorphous or graphitic forms, is achieved by the use of liquid oxidizers such as sodium peroxide, a chromium trioxide and sulfuric acid mixture, or a nitric acid and hydrogen peroxide mixture. 31 Thermal oxidation process uses temperatures of 400°C-430°C to allow the oxidation of sp 2 -bonded carbon species in the air, with negligible alteration in sp 3 -bonded carbon structures. 33 These temperature requirements for the selective oxidation of sp 2 -bonded carbon species were confirmed by Pichot et al 32 The oxidation of NDs at a high temperature using air containing ozone is another approach that results in the removal of the majority of sp 2 -hybridized carbon structures.…”
Section: Temperature T (°C)mentioning
confidence: 99%
“…145 Furthermore, there was no reduction in the bactericidal activity of lysozymes upon adsorption onto the NDs' surface, proving that the NDs did not interfere with the therapeutic activity of the attached entity. cancer cells by identifying the sp 3 carbon Raman signals of NDs. 146 Growth hormone-ND complexes were created by carboxylating and covalently linking 100 nm NDs to the growth hormone.…”
Section: Elastic and Inelastic Light Scattering Imagingmentioning
confidence: 99%
“…It detains an extreme mechanical hardness (ca. 90 GPa) and wear resistance, one of the highest bulk modulus (1.2 × 10 12 N.m −2 ), the lowest compressibility (8.3 × 10 −13 m 2 N −1 ), the highest room temperature thermal conductivity (2 × 10 3 W m −1 K −1 ), a very low thermal expansion coefficient at room temperature (1 × 10 −6 K) and is very resistant to chemical corrosion (Das & Singh, 2007;Grácio et al, 2010).…”
Section: Diamond Coatingsmentioning
confidence: 99%
“…These films can be deposited by several techniques, such as Hot Filament Chemical Vapour Deposition (HF CVD), Microwave Plasma CVD (MP CVD), Plasma Jet CVD, or Flame CVD [2].The film characteristics depend on several different deposition process parameters, such as the gas composition and pressure, the substrate temperature, the energy of the impinging ions, etc [3]. The presence of hydrogen in the gas phase promotes the formation of sp 3 C structures but co-deposition of sp 2 carbon phase, as detected by Raman spectroscopy, also takes place [4].…”
mentioning
confidence: 99%
“…These films can be deposited by several techniques, such as Hot Filament Chemical Vapour Deposition (HF CVD), Microwave Plasma CVD (MP CVD), Plasma Jet CVD, or Flame CVD [2].…”
mentioning
confidence: 99%