Diamond-like carbon thin films synthesis by low temperature atmospheric pressure plasma method

Liu, Wen-Jen; Guo, Xiaojing; Chang, Chi-Lung; Lü, Jie

doi:10.1016/j.tsf.2009.02.047

Cited by 26 publications

(17 citation statements)

References 13 publications

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“…In addition, introducing background gas is necessary during cluster production or PLD for plasma cooling, controlling the plume expansion dynamics, and slowing down the energetic particles. [40][41][42] The spectra show strong emission from carbon lower-charged ions (especially from ns LPP), neutrals, and dimers (C 2 ). The spectrum emitted by ns LA is more intense and dominated by C þ and C 2þ lines due to higher number of photons per laser pulse and laser-plasma heating, which does not occur during fs LA.…”

Section: B Optical Emission Spectroscopymentioning

confidence: 99%

Emission features of femtosecond laser ablated carbon plasma in ambient helium

Al-Shboul

Harilal

Hassanein

2013

Journal of Applied Physics

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Section: B Optical Emission Spectroscopymentioning

confidence: 99%

Emission features of femtosecond laser ablated carbon plasma in ambient helium

Al-Shboul

Harilal

Hassanein

2013

Journal of Applied Physics

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“…There are no reports on the use of the floating‐electrode atmospheric DBD jet for films deposition, though several different other types of AP plasma jets have been used as depositing tools. They include an ultrahigh frequency (UHF, 450 MHz) inductively coupled plasma (ICP) microplasma jet,12 radio frequency (RF, 13.56–27.12 MHz) capacitively coupled plasma (CCP) plasma jets,13–15 a 68 kHz plasma torch without a dielectric barrier between plasma and the powered electrode,16 and a 30 kHz afterglow pulsed DBD jet 17. Several of these studies focused on inorganic film deposition with high power density sources 12, 14, 15.…”

Section: Introductionmentioning

confidence: 99%

“…Benedikt et al and Kasih et al employed argon as the working gas to generate the CCP plasma jet and the plasma torch for polymerlike and polymer film deposition, respectively 13, 16. DBD jets were used by Liu et al17 to synthesize diamond‐like carbon (DLC) films but in an indirect afterglow mode. Detailed substrate temperature measurements were not performed in these works.…”

Section: Introductionmentioning

confidence: 99%

Low‐temperature Polymer Deposition in Ambient Air Using a Floating‐electrode Dielectric Barrier Discharge Jet

Tsai

Staack

2011

Plasma Processes & Polymers

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Plasma‐polymerized PMMA films were obtained by a low‐temperature ambient deposition technique using a floating‐electrode DBD jet with two distinct operation modes, namely a diffuse mode and a concentrated mode. Deposition rates, surface morphologies, atomic compositions, and chemical bond concentrations of the PMMA films showed a dependence on the modes. In the concentrated mode rapid deposition (22 nm · s−1) can be achieved with the substrate temperature merely rising to 39 °C. Besides transparent PMMA films with high quality, opaque films with wrinkled microstructures due to buckling effects were obtained. Similar functional groups to those in pure PMMA were also observed by both XPS and FTIR results. It was demonstrated that PMMA films can be successfully grown on different substrate materials, such as glass, plastic, rubber, onion skin, and fingernail.

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“…Hence, DLC films have had various applications, such as in car engine parts, electromechanical devices, magnetic storage disks, articulations, and bio-lubricants [2,[8][9][10][11][12]. Unlike diamond films, which are prepared in a high temperature process [13,14], DLC films can be fabricated at low temperature [15][16][17][18]. However, DLC films have some disadvantages, such as a high internal compressive stress, poor adhesion, and low transmittance [19,20].…”

Section: Introductionmentioning

confidence: 99%

Fabrication of Transparent Very Thin SiOx Doped Diamond-Like Carbon Films on a Glass Substrate

Liao

Wei

et al. 2018

Coatings

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A novel direct current (DC) magnetron sputtering system via radio frequency (RF) bias with hexamethyldisiloxane (HMDSO) plasma polymerization was developed for the deposition of SiO x-doped diamond-like carbon (DLC) films on a glass substrate. As the RF bias increased, the ratio of intensity of D peak and G peak (I(D)/I(G)) decreased and the G peak shifted to a low position, leading to high hardness and a large portion of sp 3 bonds. Additionally, weak sp 2 graphite bonds were broken and sp 3 diamond bonds formed because the RF bias attracted hydrogen ion bombarding the DLC films. Increasing DC power was helpful to improve the hardness of the DLC films because the proportion of sp 3 bonds and the I(D)/I(G) ration was increased. HMDSO was introduced into this process to form SiO x :DLC films with enhanced optical performance. The average transmittance in the visible region of these very thin SiO x :DLC films with a thickness of 37.5 nm was 80.3% and the hardness of the SiO x :DLC films was increased to 7.4 GPa, which was 23.3% higher than that of B270 substrates.

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Diamond-like carbon thin films synthesis by low temperature atmospheric pressure plasma method

Cited by 26 publications

References 13 publications

Emission features of femtosecond laser ablated carbon plasma in ambient helium

Emission features of femtosecond laser ablated carbon plasma in ambient helium

Low‐temperature Polymer Deposition in Ambient Air Using a Floating‐electrode Dielectric Barrier Discharge Jet

Fabrication of Transparent Very Thin SiOx Doped Diamond-Like Carbon Films on a Glass Substrate

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