2018
DOI: 10.1016/j.tsf.2018.08.007
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Diamond-like amorphous carbon layer film by an inductively coupled plasma system for next generation etching hard mask

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Cited by 23 publications
(8 citation statements)
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“…In addition to the common first-order Raman peaks, the spectra of the nanocatalysts also revealed the presence of other vibrational modes [ 54 , 55 ], as indicated by the shoulder at ~1150–1154 cm −1 , as shown in Figure 7 by an asterisk (*). The observed shoulder (*) is assigned to sp 3 hybridized carbons of disordered diamond-like amorphous carbon [ 56 , 57 ]. The position and broadness of different vibrational bands in carbon-based nanomaterials can be used as a measure for quantifying local structural disorders [ 58 , 59 , 60 ].…”
Section: Resultsmentioning
confidence: 99%
“…In addition to the common first-order Raman peaks, the spectra of the nanocatalysts also revealed the presence of other vibrational modes [ 54 , 55 ], as indicated by the shoulder at ~1150–1154 cm −1 , as shown in Figure 7 by an asterisk (*). The observed shoulder (*) is assigned to sp 3 hybridized carbons of disordered diamond-like amorphous carbon [ 56 , 57 ]. The position and broadness of different vibrational bands in carbon-based nanomaterials can be used as a measure for quantifying local structural disorders [ 58 , 59 , 60 ].…”
Section: Resultsmentioning
confidence: 99%
“…It should be noted that our nitrogen-doped amorphous carbon made by the DC sputtering process is denser than nitrogen-doped amorphous carbon made by the PE-CVD process. 11,17 This means that amorphous carbon thin lms made by the DC sputtering process are expected to be effective in manufacturing the excellent hardmasks, because they contain less hydrogen than carbon thin lms made by the PE-CVD process.…”
Section: Basic Characteristics Of Nitrogen-doped Amorphous Carbon Lmsmentioning
confidence: 99%
“…However, amorphous carbon lms fabricated through PE-CVD inevitably contain hydrogen due to the CH-based precursor, which causes degradation of the physical properties according to the hydrogen concentration, making it challenging to obtain high-aspect-ratio patterning. [10][11][12][13][14] To overcome this problem and improve the performance of the hardmask, studies have been conducted to predict a method that may have high resistance to uorine, a major etching gas, through DFT calculation. As a result of the calculation, a method of controlling the amount of hydrogen bonded to carbon or doping other substances was suggested.…”
Section: Introductionmentioning
confidence: 99%
“…It consists of sp 2 - and sp 3 -hybridized carbon atoms, and its physical properties are a function of hybridization ratios . The broad range of properties of carbon allotropes has made them appropriate for a wide variety of applications, important examples of which are substrates, optical components, heat sinks, electrodes, electronic devices, lubricants, hard masks, corrosion-resistive coatings, and diffusion barriers. …”
Section: Introductionmentioning
confidence: 99%