“…In these applications, the value of breakdown studies varies: on the one hand, many applications need to prevent MRF breakdown from occurring, such as CCP, which is widely used in etching and deposition equipment, where dielectric rings are usually placed at large radii of the electrodes to improve the radial homogeneity of the plasma, and gas breakdown at the dielectric rings can lead to unstable discharges and the generation of impurities, thus requiring the avoidance of breakdown [18,19]. In addition, the reliable operation of MRF gas pedals also requires the avoidance of any gas or along-plane breakdown [20]; on the other hand, the MRF plasma widely used in industry is generated by lowpressure gas breakdown, and the breakdown voltage is usually higher than the steady-state voltage, and engineers must study how to break down the gas to generate plasma at low gas pressure and low RF voltage [20,21].…”