2022
DOI: 10.1088/2058-6272/aca648
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Gas breakdown in radio-frequency field within MHz range: a review of the state of the art

Abstract: Low-temperature plasmas (LTPs) driven by 1-100 MHz radio-frequency (MRF) is essential for many industrial applications, and their breakdown characteristics are different from direct current (DC) breakdown. This review seeks to understand the state of the art of electric breakdown in the MRF field and provide references for related basic and applied research. We have given a brief history of the research of MRF-driven breakdown, including the Paschen curves, the corresponding discharge modes and parameter space… Show more

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Cited by 5 publications
(4 citation statements)
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References 101 publications
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“…The general scheme of the methane conversion by the microwave plasma was considered in the aboveliterature [2][3][4][5]. This scheme can be presented by the combination of the following main reactions:…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…The general scheme of the methane conversion by the microwave plasma was considered in the aboveliterature [2][3][4][5]. This scheme can be presented by the combination of the following main reactions:…”
Section: Resultsmentioning
confidence: 99%
“…Thus, the lighter electrons and some ions quickly accelerate to higher velocities than the heavier neutral molecules, so the kinetic energy of electrons is much higher than the bulk neutrals causing nonequilibrium plasma [4]. Since such a plasma does not raise the temperature of the bulk gas, it is termed as cold or non-thermal plasma [5].…”
Section: Introductionmentioning
confidence: 99%
“…In recent years, the peak power of high-power microwave has reached the GW level, which easily causes breakdown on the vacuum side or even the gas side of the dielectric window [1][2][3][4][5][6][7][8][9][10][11]. The secondary electron multipactor is one of the dominant reactions of breakdown on the vacuum side of the dielectric window, i.e.…”
Section: Introductionmentioning
confidence: 99%
“…as pressure p, gap distance d, driving frequency f and electrode properties [10][11][12]. Capacitively coupled plasma sources are typically used for dry etching in the field of semiconductor chip manufacturing [13][14][15], and a comprehensive understanding of the breakdown characteristics of low-pressure radiofrequency (rf) discharges would facilitate the optimization of their operating conditions [16,17]. Korolov et al [18,19] and Lisovskiy et al [20,21] have experimentally measured rf breakdown curves under various conditions, demonstrating the dependence of rf breakdown on factors such as gas species and discharge dimensions.…”
mentioning
confidence: 99%