Diagnosis of dielectric barrier discharge CH4 plasmas for diamond-like carbon film deposition

Plasma enhanced CVD of fluorocarbon films by low-pressure dielectric barrier discharge

“…Dangling bond sites may be produced during plasmasurface interactions via energetic ion bombardments. In our previous study, DBD CH 4 plasmas during diamond-like carbon film deposition have been characterized in-situ by means of the Langmuir double probe method [27]. The measured electron temperature changes from 3.0 to 5.8 eV, depending on the Pd value.…”

“…It is generally assumed that the constant exposure to energetic ions typically leads to deposition of more brittle FC films with crosslinked structure [22,24,25]. Decreasing deposition pressure may lead to a rapid increase in the breakdown voltage [27]. The higher breakdown voltage at smaller Pd-value corresponds to a large potential drop, and thus a stronger electrical field across the discharge gas spacing, which causes generation of more energetic ions.…”

Effects of working pressure on the deposition of diamond-like carbon films prepared by bipolar-type plasma based ion implantation

“…[11][12][13]. In addition, the CH F 2 D-{ 2 P and CH D 2 R-{ 2 P bands are observed at 432 and 390 nm, respectively [11][12][13]. The emissions of the C 2 Swan system, transition F 3 P g -{ 3 P u , vibrant sequences Dm = À1, 0, +1 also appears around 560, 516 and 466 nm, respectively [14].…”

“…Namely, the reduction of mechanical properties corresponds to the decrease of the density. [11][12][13]. In addition, the CH F 2 D-{ 2 P and CH D 2 R-{ 2 P bands are observed at 432 and 390 nm, respectively [11][12][13].…”

Correlation between a-C:H film properties and Ar/CH4 dielectric barrier discharge

“…The hardness and the content of sp 3 hybridization bonds of a-C:H film deposited in CH 4 plasma were explained by the contribution of ion bombardment [6,7]. In the present work, we investigated a-C:H film deposition in Ar/CH 4 gas dielectric barrier discharge (DBD).…”