Plasma enhanced CVD of fluorocarbon films by low-pressure dielectric barrier discharge

Liu, Dongping; Li, Wei; Feng, Zhiqing; Tan, Xiaodong; Chen, Baoxiang; Niu, Jinhai; Liu, Yanhong

doi:10.1016/j.surfcoat.2008.10.023

Cited by 20 publications

(6 citation statements)

References 26 publications

(37 reference statements)

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“…The discharge powers as a function of f and V PP are plotted in Figure 6a and b, respectively. The discharge power linearly increases with V PP varying from 6 to 16 kV, or f varying from 1 to 15 kHz, which is well consistent with our previous reports 23, 24. An increase in the discharge power indicates an improvement in the density of the plasmas generated at atmospheric pressure in the sealed package.…”

Section: Resultssupporting

confidence: 91%

The Inactivation of Resistant Candida Albicans in a Sealed Package by Cold Atmospheric Pressure Plasmas

Song

Liu

et al. 2011

Plasma Processes & Polymers

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It remains a challenge to generate cold, atmospheric pressure plasmas in sealed packages for biological disinfection. In this paper, we report a plasma device to form large‐area and atmospheric‐pressure plasmas in a sealed package for the low‐temperature disinfection of fungi. The visually uniform plasmas were easily generated in the portable plastic bag containing Candida albicans with a population of 105 spores placed on the plasma device. The He plasma containing about 1% O2 was found to entirely kill resistant Candida albicans with a treatment time of 5 min. Measurements for optical emission spectra and disinfection efficiencies indicate that the plasma‐created species such as O radicals and charged species play a major role in the inactivation process.

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Section: Resultssupporting

confidence: 91%

The Inactivation of Resistant Candida Albicans in a Sealed Package by Cold Atmospheric Pressure Plasmas

Song

Liu

et al. 2011

Plasma Processes & Polymers

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“…Miclea et al [23,24] reported glow discharges in a low-pressure noble gas driven by a rectangular ac voltage as a powerful microchip source for analytical spectrometry. The influence of the gas discharge pressure was investigated in a simple vacuum-tight DBD discharge to deposit fluorocarbon (FC) films on Si substrates [25][26][27]. The ac power supply source was capable of supplying bipolar sine wave output with a 0-30 kV peak voltage at an ac frequency of 1.4 kHz.…”

Section: Introductionmentioning

confidence: 99%

Numerical investigation of the effect of driving voltage pulse shapes on the characteristics of low-pressure argon dielectric barrier discharge

Eslami

Barjasteh

Morshedian³

2015

Plasma Phys. Rep.

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In this work, we numerically compare the effect of a sinusoidal, triangular, and rectangular pulsed voltage profile on the calculated particle production, electric current, and gas voltage in a dielectric barrier discharge. The total argon gas pressure of 400 Pa, the distance between dielectrics of 5 mm, the dielectric thickness of 0.7 mm, and the temperature of T = 300 K were considered as input parameters. The different driving voltage pulse shapes (triangular, rectangular, and sinusoidal) are considered as applied voltage with a frequency of 7 kHz and an amplitude of 700 V peak to peak. It is shown that applying a rectangular voltage, as compared with a sinusoidal or triangle voltage, increases the current peak, while the peak width is decreased. Higher current density is related to high production of charged particles, which leads to the generation of some highly active species, such as Ar* (4s level), and Ar** (4p level) in the gap.

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“…Recently, we have used low-pressure DBD plasmas to deposit diamond-like carbon films [17−19] , fluorocarbon films [20,21] , silicon oxide films [22] and amorphous carbon nitride films [23,24] . Also, DBDs have been applied to the plastic surface modifications [25] .…”

Section: Introductionmentioning

confidence: 99%

Plasma-Assisted Chemical Vapor Deposition of Titanium Oxide Films by Dielectric Barrier Discharge in TiCl₄/O₂/N₂Gas Mixtures

Niu

Zhang

Fan

et al. 2014

Plasma Sci. Technol.

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Low-pressure dielectric barrier discharge (DBD) TiCl4/O2 and N2 plasmas have been used to deposit titanium oxide films at different power supply driving frequencies. A homemade large area low pressure DBD reactor was applied, characterized by the simplicity of the experimental set-up and a low consumption of feed gas and electric power, as well as being easy to operate. Atomic force microscopy, scanning electron microscopy, energy dispersive spectroscopy, and contact angle measurements have been used to characterize the deposited films. Experimental results show all deposited films are uniform and hydrophilic with a contact angle of about 15 o . Compared to titanium oxide films deposited in TiCl4/O2 gas mixtures, those in TiCl4/O2/N2 gas mixtures are much more stable. The contact angle of titanium oxide films in TiCl4/O2/N2 gas mixtures with the addition of 50% N2 and 20% TiCl4 is still smaller than 20 o , while that of undoped titanium oxide films is larger than 64 o when they are measured after one week. The low-pressure TiCl4/O2 plasmas consist of pulsed glow-like discharges with peak widths of several microseconds, which leads to the uniform deposition of titanium oxide films. Increasing a film thickness over several hundreds of nm leads to the film's fragmentation due to the over-high film stress. Optical emission spectra (OES) of TiCl4/O2 DBD plasmas at various power supply driving frequencies are presented.

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Plasma enhanced CVD of fluorocarbon films by low-pressure dielectric barrier discharge

Cited by 20 publications

References 26 publications

The Inactivation of Resistant Candida Albicans in a Sealed Package by Cold Atmospheric Pressure Plasmas

The Inactivation of Resistant Candida Albicans in a Sealed Package by Cold Atmospheric Pressure Plasmas

Numerical investigation of the effect of driving voltage pulse shapes on the characteristics of low-pressure argon dielectric barrier discharge

Plasma-Assisted Chemical Vapor Deposition of Titanium Oxide Films by Dielectric Barrier Discharge in TiCl₄/O₂/N₂Gas Mixtures

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Plasma enhanced CVD of fluorocarbon films by low-pressure dielectric barrier discharge

Cited by 20 publications

References 26 publications

The Inactivation of Resistant Candida Albicans in a Sealed Package by Cold Atmospheric Pressure Plasmas

The Inactivation of Resistant Candida Albicans in a Sealed Package by Cold Atmospheric Pressure Plasmas

Numerical investigation of the effect of driving voltage pulse shapes on the characteristics of low-pressure argon dielectric barrier discharge

Plasma-Assisted Chemical Vapor Deposition of Titanium Oxide Films by Dielectric Barrier Discharge in TiCl4/O2/N2Gas Mixtures

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Plasma-Assisted Chemical Vapor Deposition of Titanium Oxide Films by Dielectric Barrier Discharge in TiCl₄/O₂/N₂Gas Mixtures