2007
DOI: 10.1117/12.728958
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DFM based on layout restriction and process window verification for sub-60nm memory devices

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Cited by 3 publications
(3 citation statements)
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“…The first modification called ridge regression [6] is used to prevent any subset of the fitted coefficients from becoming overly large by incorporating the estimated coefficients in the residual squared sum(RSS) in equation (4). fˆ is the vector of contour/drawn measurements and D is the matrix of rasterized layout values associated with the measurements.…”
Section: Figure 7 -Drawn Layout Measurement Site Placementmentioning
confidence: 99%
See 1 more Smart Citation
“…The first modification called ridge regression [6] is used to prevent any subset of the fitted coefficients from becoming overly large by incorporating the estimated coefficients in the residual squared sum(RSS) in equation (4). fˆ is the vector of contour/drawn measurements and D is the matrix of rasterized layout values associated with the measurements.…”
Section: Figure 7 -Drawn Layout Measurement Site Placementmentioning
confidence: 99%
“…One approach is to avoid generating layout structure either through the use of restricted design rules [4] [11] [12] or embedding algorithms for avoidance of litho hotspot susceptible structures into the physical implementation tools [3] [5] [7] [13] . The second approach is based on repairing any litho-hotspots found by a checking tool.…”
Section: Previous Workmentioning
confidence: 99%
“…One approach is to avoid generating layout structure either through the use of restricted design rules [3][9][10] [11] or embedding algorithms for avoidance of litho hotspot susceptible structures into the physical implementation tools [2][4] [5] [12] , i.e. correct by construction.…”
Section: Previous Workmentioning
confidence: 99%