1988
DOI: 10.1051/jphyscol:1988405
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Device Characterisation of a High Density Half-Micron Cmos Process

Abstract: A b s t r a c t The device characterisation and the ringoscillator performance of a high density half-micron CMOS process were studied. A novel recessed field isolation technology , twin retrograde wells, N + poly-silicon gate material and lightly doped drain structures for both the n-and p-channel devices were used in the device fabrication. The device properties and the ringoscillator performance will be presented.

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“…The introduction of retrograde wells where the doping density increases with depth was pivotal in the development of high-density CMOS [54], [55]. Such wells have fascinating effects on charge motion within the silicon due to inherent electric fields.…”
Section: Electron Injection Diffusion and Driftmentioning
confidence: 99%
“…The introduction of retrograde wells where the doping density increases with depth was pivotal in the development of high-density CMOS [54], [55]. Such wells have fascinating effects on charge motion within the silicon due to inherent electric fields.…”
Section: Electron Injection Diffusion and Driftmentioning
confidence: 99%