Development of microconnector with automatic connecting/disconnecting mechanism

Okuyama, Hiroshi; Haga, Tsuyoshi; Emura, Katsuji; Tazaki, Hiroshi

doi:10.1109/memsys.1999.746828

Cited by 9 publications

(2 citation statements)

References 6 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…We tried to optimize an appropriate R using several size R (5 to 200µm) by the same LNF contact which will be described in this paper. To fabricate this miniature contact, a MEMS technology is used because the existing pressing and injection molding method is not compatible with the high-density packaging required in the advanced IT market [3][4][5][6][7][8]. This research focuses on a fabrication of micro interposer by combining UV thick resist photolithography and Ni-Co fine electroforming technology.…”

Section: Fig 1: Ic Test Socket Applicationmentioning

confidence: 99%

See 1 more Smart Citation

Development and Optimization of a Low Normal Force Contact

Bhuiyan

Alamgir

Rashid

2014

AMR

View full text Add to dashboard Cite

Throughout the technological advancements, electronic devices are getting high dense and less expensive in day by bay. Thus, significantly reducing the production cost is the vital issue in order to produce more competitive device with maintaining its standard in all expect. Therefore, introducing new compact contact in high-Hertz stress with low normal force (LNF) will be a key technology to achieve the future goal. In this research, it is identified that only a 5μm radial tip with 0.1N force contact provides an excellent electrical performance which is much sharper than conventional connectors. This invention gives a big hope to produce less expensive and high dense Low Normal Force contact. The contacts durability test were also successfully passed 0.30 million cycles of uses while the contact resistance were ≦50mΩ.

show abstract

Section: Fig 1: Ic Test Socket Applicationmentioning

confidence: 99%

“…The transcript seat lamination is done to the top of the structure (7). Base structure removed from bright electroplates (8). Lastly, the structure is removed from the 1st electroplates (9).…”

Section: Fabrication Processmentioning

confidence: 99%

Development and Optimization of a Low Normal Force Contact

Bhuiyan

Alamgir

Rashid

2014

AMR

View full text Add to dashboard Cite

show abstract

Development of microconnector with an automatic connecting/disconnecting mechanism

Haga

Okuyama

Tazaki

2000

Microsystem Technologies

Self Cite

View full text Add to dashboard Cite

We developed microconnectors with an automatic connecting/disconnecting mechanism using magnetic force. The electrical terminals were designed to minimize the friction force during connection/disconnection and were fabricated using a deep X-ray lithography technique. The diameter and thickness of the microconnector are 2.5 mm and 2 mm, respectively. We con®rmed the electrical connection at 160 mA/line and the automatic connection/disconnection at a distance of 600 lm between opposing microconnectors.

show abstract