Development of Cooling Technology in a Megasonic Cleaning System for Flat Panel Display

Abstract

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Dissolution Amplification by Resonance and Cavitational Stimulation at Ultrasonic and Megasonic Frequencies

“…Several criteria can influence cavitation behavior, including system temperature, particle size, particle composition, and the acoustic stimulation frequency. − The focus of this study is the comparative effects of two stimulation frequencies: 20 kHz (ultrasonic) and 1 MHz (megasonic). Ultrasonically enhanced dissolution of minerals has focused on stimulation at low ultrasonic frequencies (i.e., 16–40 kHz). ,,,− In contrast, megasonic stimulation (i.e., greater than 1 MHz) is used for fine tasks such as the cleaning of delicate equipment (e.g., microchips, − flat panel displays, , photomasks, , etc.). These varied stimulation frequencies give rise to different critical cavitation bubble sizes, with values of ∼150 μm at 20 kHz and of ∼4 μm at 1 MHz .…”

“…Ultrasonically enhanced dissolution of minerals has focused on stimulation at low ultrasonic frequencies (i.e., 16−40 kHz). 1,2,4,20−22 In contrast, megasonic stimulation (i. greater than 1 MHz) is used for fine tasks such as the cleaning of delicate equipment (e.g., microchips, 23−27 flat panel displays, 28,29 photomasks, 30,31 etc.). These varied stimulation frequencies give rise to different critical cavitation bubble sizes, with values of ∼150 μm at 20 kHz and of ∼4 μm at 1 MHz.…”