2019
DOI: 10.1088/1742-6596/1243/1/012004
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Development of a distributed ferromagnetic enhanced inductively coupled plasma source for plasma processing

Abstract: A low frequency (∼100 kHz) distributed ferromagnetic enhanced inductively coupled plasma (FMICP) source with a separate supply of argon and chlorine into the main discharge chamber is proposed in order to obtain a large volume of dense (1010−1012 cm-3) uniform plasma at low pressures (1−100 mTorr). Argon is activated by FMICP sources in U-shaped tubes and diffuses into the main chamber, mixing with chlorine. The Ar/Cl2 mixture is also activated in the main discharge chamber by vortex alternating electric field… Show more

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Cited by 5 publications
(2 citation statements)
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“…This situation can be improved by increasing the pumping capacity and the argon flow rate, respectively. At high argon flow rates we can expect a decrease of chlorine concentration and electric field strength in the Ushaped tubes, leading to lower values of power consumed by plasma in the U-shaped tubes [32].…”
Section: Resultsmentioning
confidence: 97%
“…This situation can be improved by increasing the pumping capacity and the argon flow rate, respectively. At high argon flow rates we can expect a decrease of chlorine concentration and electric field strength in the Ushaped tubes, leading to lower values of power consumed by plasma in the U-shaped tubes [32].…”
Section: Resultsmentioning
confidence: 97%
“…In this case, a minimal value of FMICP resistance is desirable in the U-shaped tube, to minimize the value of absorbed power and hence the value of power losses. To solve this problem, we have proposed using a separate feed of Cl 2 and Ar 31) into the processing chamber and the U-shaped tube, to minimize the U-shaped tube's Cl concentration and the electric field strength respectively. The results on the Ar/Cl 2 FMICP electric field strength dependences obtained in this paper confirm the need for a separate gas supply to solve the problem of U-shaped tube heat loss growth with the addition of Cl 2 .…”
Section: Resultsmentioning
confidence: 99%