Development of a 130-mA, 75-kV high voltage column for high-intensity dc proton injectors

Sherman, J.D.; Arvin, A.H.; Hansborough, L.D.; Hodgkins, D.J.; Meyer, E.A.; Schneider, J.D.; Stevens, R.R.; Thuot, M.; Zaugg, T.

doi:10.1063/1.1148707

Cited by 7 publications

(2 citation statements)

References 3 publications

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“…In 1991 Taylor et al [27] proposed a design for an intense-beam 2.45 GHz microwave ion source for a CW radio frequency quadrupole (RFQ) injector. The proton fraction of the source was up to 90%, and the beam current density was up to 350 mA/cm 2 , which has been the basis for most of the existing high-intensity 2.45 GHz microwave sources, due to their simplicity and reliability [9,28,29]. The main features include using an impedance matching section to reduce the microwave power reflection between the waveguide and plasma chamber, which could enhance the microwave power coupling efficiency, and using solenoids to generate the desired magnetic field distribution.…”

Section: Microwave Plasma and Sourcesmentioning

confidence: 99%

RF and Microwave Ion Sources Study at Institute of Modern Physics

Jin

Liu

Zhou

et al. 2021

Plasma

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Intense ion beam production is of high importance for various versatile applications from accelerator injectors to secondary ion mass spectrometry (SIMS). For these purposes, different types of ion beams are needed and, accordingly, the optimum plasma to produce the desired ion beams. RF-type plasma features a simple structure, high plasma density and low plasma temperature, which is essential for negative ion beam production. A very compact RF-type ion source using a planar coil antenna has been developed at IMP for negative molecular oxygen ion beam production. In terms of high-intensity positive ion beam production, 2.45 GHz microwave power-excited plasma has been widely used. At IMP, we developed a 2.45 GHz plasma source with both ridged waveguide and coaxial antenna coupling schemes, tested successfully with intense beam production. Thanks to the plasma built with an external planar coil antenna, high O2− production efficiency has been achieved, i.e., up to 43%. With 2.45 GHz microwave plasma, the ridged waveguide can support a higher power coupling of high efficiency that leads to the production of intense hydrogen beams up to 90 emA, whereas the coaxial antenna is less efficient in power coupling to plasma but can lead to attractive ion source compactness, with a reasonable beam extraction of several emA.

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Section: Microwave Plasma and Sourcesmentioning

confidence: 99%

RF and Microwave Ion Sources Study at Institute of Modern Physics

Jin

Liu

Zhou

et al. 2021

Plasma

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“…There are various devices used as a microwave launcher viz. coaxial line (Sakudo et al 1977), open ended waveguide (Krestschmer et al 1980), horn, slotted and helical antenna (Baskaran et al 1992a, b), ridged and tapered waveguide (Sherman et al 1998;Celona et al 1998Celona et al , 2000. The performance of plasma source viz.…”

Section: Microwave Launchermentioning

confidence: 99%

Study of microwave components for an electron cyclotron resonance source: Simulations and performance

Jain

Sharma

Senecha

et al. 2014

Sadhana

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A high power (2 kW, CW) magnetron-based microwave system operating at 2.45 GHz has been designed, tested, characterized, and used to produce plasma. The system consists of a microwave source, an isolator, a directional coupler, a threestub tuner, a high voltage break, a microwave vacuum window, and a microwave launcher. These microwave components were simulated using microwave studio software. The low power and full term characterization of the microwave system has been done using vector network analyzer. The system was tested for 2 kW continuous wave of microwave power using glass-water load. The microwave system has been developed to study the microwave interaction with plasma at different operation regimes (Gases: Nitrogen, argon and hydrogen; Gas pressure : 10 −5-10 −3 mbar; Microwave power : 300-1000 W; Magnetic field: 875-1000 G) and to extract the proton beam current with hydrogen produced plasma. A plasma density ∼5 × 10 11 cm −3 and average electron temperature of ∼13 eV was obtained. This article describes various aspects of the microwave system including design, fabrication, characterization and performance studies of the microwave components.

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