Development of a 1.5D reference comparator for position and straightness metrology on photomasks

Flügge, Jens; Köning, Rainer; Weichert, Christoph; Häßler-Grohne, Wolfgang; Geckeler, Ralf D.; Wiegmann, Axel; Schulz, Michael; Elster, Clemens; Bosse, Harald

doi:10.1117/12.801251

Cited by 7 publications

(7 citation statements)

References 14 publications

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“…Developments to enhance the measurement capability of 1D comparators with additional straightness measurement capability were described [58] and could be applied for high precision calibration of 1.5D encoders [91,112] and combined length and straightness calibrations of graduations on planar substrates like e.g. photomasks.…”

Section: Medium Range Length Measurement Systems (<05 M)mentioning

confidence: 99%

Measurement technologies for precision positioning

et al. 2015

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Section: Medium Range Length Measurement Systems (<05 M)mentioning

confidence: 99%

Measurement technologies for precision positioning

et al. 2015

Self Cite

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“…B. auf Arrays aus chromatischen Sensoren [9] oder Abstandsinterferometern [10]. Bauartbedingt kön-nen diese Sensoren nicht beliebig dicht platziert werden.…”

Section: Laterale Auflösung Und Große Sensorabständeunclassified

“…Dies limitiert die Prüflingshöhe auf etwa 100 μm für Messunsicherheiten im niedrigen zweistelligen Nanometerbereich. Jedoch erlaubt das TMS-Verfahren bei Verwendung von Abstandsinterferometern als Sensoren und geeigneter Prüflingsform auch Messunsicherheiten unterhalb von einem Nanometer [10]. Für industrielle Applikationen mit geringeren Anforderungen an die Messunsicherheit wurde das TMS-Verfahren bereits in die Industrie transferiert [9].…”

Section: Schlussfolgerungenunclassified

Absolute Profilmessung optischer Oberflächen mit Mehrfachsensorsystemen

Wiegmann¹,

Schulz

Elster

2011

Tm - Technisches Messen

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Zusammenfassung Es wird ein hochgenaues Verfahren und dessen Realisierung zur Messung von Profilschnitten von ausgedehnten (bis zu 1 m großen) optischen Oberflä-chen vorgestellt. Dabei wird ein kompaktes Interferometer (Aperturdurchmesser 3 mm) über den Prüfling geführt und es werden mehrere sich überlappende Teilprofile aufgenommen. Eine zusätzliche Winkelmessung dient als Ebenheitsreferenz. Im Gegensatz zu herkömlichen "Stitching"-Verfahren ermög-licht das vorgestellte Messverfahren z. B. die Messung von Synchrotronspiegeln inklusive ihres parabolischen Anteils mit hoher lateraler Auflösung (Messpunktabstand 20 μm) und hohem Dynamikumfang ("peak-to-valley" Höhe bis 100 μm) bei gleichzeitigen Messunsicherheiten im Nanometer-Bereich. Beispielhaft werden die Ergebnisse einer Profilmessung mit zugehörigen Messunsicherheiten gezeigt.Summary We present a method and its realization for high precision profile measurement of large specimens (up to 1 m length). A compact interferometer (aperture diameter 3 mm) is moved over the specimen under test and several overlapping sub-profile measurements are taken. An additional angle measurement serves as flatness reference. In contrast to common stitching techniques, the presented method allows for the measurement of complex optical surfaces, e. g. synchrotron mirrors, including their parabolic part with a high lateral resolution (sampling interval 20 μm), high dynamic range (peak-to-valley height up to 100 μm) and measurement uncertainties in the nanometer region. As an example, we present the results of a specific profile measurement including the evaluation of the respective measurement uncertainties.

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“…They can be calibrated by using different measurement set-ups, depending on their length and precision. Set-ups for calibrating high-precision line scales normally involve a microscope with an optical sensor for capturing and analysing the image of a line marker and a laser interferometer as a traceable measurement standard [4][5][6].…”

Section: Introductionmentioning

confidence: 99%

Automatic high resolution measurement set-up for calibrating precise line scales

Klobucar¹,

Ačko²

2017

Adv produc engineer manag

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This paper presents a high resolution measurement set-up developed for calibrating precise line scales with measurement uncertainty of less than 0.1 µm over a total length of 500 mm. The system integrates a numerically controlled multi-axis stage, a laser interferometer, and a vision system for detecting line position. The measurement and the analysis processes are completely automated in order to minimize manual labour during the calibration process, but also increase the calibration accuracy. Increasing calibration accuracy leads up to better quality of industrial measurements which is required by modern precision industry. When designing this set-up, special attention was paid to the alignment of the measurement object in the measurement direction, considering the focus of the camera. The aim of this alignment was to reduce Abbe errors in 2 axes to negligible level. In addition, all uncertainty contributions have been determined and evaluated by performing extended experiments in specific measurement conditions. These contributions are presented in the uncertainty budget. The metrological capabilities of the presented measurement set-up were verified by some practical test measurements. Selected results of these measurements are presented in the article. This set-up will primarily improve a standard base for calibration of optical measuring devices. The use of the optical standards in the industry is constantly growing. Indirect users of the results of this research will be all manufacturers of precise products such as automotive and other industries.

show abstract

Development of a 1.5D reference comparator for position and straightness metrology on photomasks

Cited by 7 publications

References 14 publications

Measurement technologies for precision positioning

Measurement technologies for precision positioning

Absolute Profilmessung optischer Oberflächen mit Mehrfachsensorsystemen

Automatic high resolution measurement set-up for calibrating precise line scales

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