2014
DOI: 10.1515/polyeng-2013-0224
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Development and characterization of novel photopolymerizable formulations for stereolithography

Abstract: Novel photopolymerizable formulations, able to photopolymerize with a dual mechanism (cationic and radical), were developed and characterized as potential resins for stereolithography (SL) process. The influence of the presence of organically modified boehmite nanoparticles on the properties of the photopolymerizable mixtures was also analyzed. The main properties required for a liquid SL resin are a high reactivity and a low viscosity. All of the experimental formulations produced, even in the presence of boe… Show more

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Cited by 15 publications
(4 citation statements)
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References 32 publications
(37 reference statements)
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“…This variability in mass could be due to the multiple factors both from the liquid formulation and the settings of the printer. The number of laser passes for each printed layer and the laser power directly affect the curing depth, and hence, the properties of the printed layer [63]. Hence, the parameters need to be optimised for each resin type.…”
Section: Resultsmentioning
confidence: 99%
“…This variability in mass could be due to the multiple factors both from the liquid formulation and the settings of the printer. The number of laser passes for each printed layer and the laser power directly affect the curing depth, and hence, the properties of the printed layer [63]. Hence, the parameters need to be optimised for each resin type.…”
Section: Resultsmentioning
confidence: 99%
“…Lately, the materialization of nanocomposites through enhancing photopolymerization has engrossed a huge amount of attention of researchers. In particular, there is a vast consideration based on the nano distribution phases comprising nanosized metals [33][34][35][36][37][38][39]. The metal oxide-based semiconductor nanoparticle has been the focus of substantial research attention in recent years [40].…”
Section: Introductionmentioning
confidence: 99%
“…The resolution of these techniques is influenced by many factors, depending both on the photocurable system (curing mechanism, kinetics, free radical diffusion, etc.) [ 33 , 34 , 35 ] and the optical system [ 36 ]. The throughput of the SLA process is slow due to the point-by-point scanning nature of the direct-write of the laser system while the DLP exploits a digital micro mirror-array device (DMD), to produce a dynamic digital mask: An entire part cross section can be cured at one time, resulting in a faster process than scanning a laser beam [ 36 ].…”
Section: Introductionmentioning
confidence: 99%