Determination of layered synthetic microstructure parameters

Temperature induced diffusion in Mo/Si multilayer mirrors

“…A Ge crystal monochromator is used in combination having two slits, resulting in an angular resolution of better than 0.01°. 19 Analysis of the smallangle reflectivity measurements is based on a fast Fourier transformation of the reflectivity around the Bragg peaks. 20,21 From this, the average interface roughness ( rms ), the thickness ratio ͑⌫͒, and the layer thickness errors ͑͒ are determined ͑⌫ is defined as the ratio of the thickness of the high-Z material to the d-spacing͒.…”

Multilayer optics for XUV spectral region: technology fabrication and applications

“…From these measurements, using the procedures reported in [47], we determined the structure period, and the thicknesses of Mo (d M o ) and Si (d Si ) layers in a period, the rms value of roughness on the layer boundaries. Measurements of angular and spectral dependencies of the multilayer structure re°ectivity for ¶ = 13.4 nm were carried out using a special re°ectometer [48] developed on the basis of the RSM-500 spectrometer-monochromator.…”

Multilayer deposition and nanostructuring by laser methods

“…Fig.5 presents a glancing angle X-ray-diffraction pattern ofa 30 period MLS deposited by CBPLD with the individual layer thickness of3 nm ofNi and 3 nm ofC. The densities ofthe layers were determined according to the method described in [13] and made for Ni 7.6 gcm3 (table value is 8.9 gcm3) and for carbon 2.9 gcm3 (table densities ofgraphite and diamond are 2.27 and 3.5 gcm3, resp.). The average r.m.s.…”