1980
DOI: 10.1016/0038-1101(80)90164-1
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Determination of existing stress in silicon films on sapphire substrate using Raman spectroscopy

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Cited by 224 publications
(54 citation statements)
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“…Previous work on Raman studies of shocked materials has been carried out by several authors. Englert et al (1980) detected a shift to higher wavelength in the position of the Raman line under compressive forces. Heymann & Cellucci (1988) specifically compared the Raman spectra of chondritic laboratory-impacted olivines and non-impacted olivines.…”
Section: (A) Shock Grade Of the Samplesmentioning
confidence: 94%
See 1 more Smart Citation
“…Previous work on Raman studies of shocked materials has been carried out by several authors. Englert et al (1980) detected a shift to higher wavelength in the position of the Raman line under compressive forces. Heymann & Cellucci (1988) specifically compared the Raman spectra of chondritic laboratory-impacted olivines and non-impacted olivines.…”
Section: (A) Shock Grade Of the Samplesmentioning
confidence: 94%
“…Such deformations can be studied with Raman spectroscopy. Several authors have used this technique to evaluate crystal deformation in highly shocked meteorites (Englert et al 1980;Heymann & Cellucci 1988;Heymann 1990;Chen & Xie 1992;Miyamoto & Ohsumi 1995;Hezel et al 2008;Weselucha-Birczynska & Zmudzka 2008; among others), but no specific Raman studies have been performed on minerals from weak-to-moderately shocked chondrites to our knowledge.…”
Section: Introductionmentioning
confidence: 99%
“…The phenomenon of Raman scattering, and the effects of mechanical stress on the Raman spectrum of single-crystal silicon, have been extensively studied and documented [106]. Englert et al used Raman spectroscopy to characterize the stress state of polysilicon films deposited on sapphire substrate [107]. In 1980's, the Mitsubishi group showed that micro-Raman spectroscopy could be used to measure mechanical stress in the Si near LOCOS structures with a spatial resolution of about 1 µm [108], [109].…”
Section: Raman Spectroscopymentioning
confidence: 99%
“…4. For simplicity, we only compared Raman peak shift rather than strain, otherwise we may have needed to use different strain-shift coefficients for the samples because they might have had bi-axial strain in unpatterned samples and uni-axial strain in those that were patterned [30][31][32][33][34][35][36][37]. The Raman peak shift for the patterned SiN samples was defined as the largest value with quasi-line-source excitation across the line pattern.…”
Section: Evaluation Of Model-device Structuresmentioning
confidence: 99%