1996
DOI: 10.1007/bf01159316
|View full text |Cite
|
Sign up to set email alerts
|

Detection of binary phases in CuInSe2 films formed by laser annealing of stacked elemental layers of In, Cu and Se

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4
1

Citation Types

0
5
0

Year Published

1999
1999
2020
2020

Publication Types

Select...
6
1

Relationship

0
7

Authors

Journals

citations
Cited by 11 publications
(5 citation statements)
references
References 8 publications
0
5
0
Order By: Relevance
“…Replacing the furnace with a laser can reduce this annealing time by 2-3 orders of magnitude. However, previous attempts at laser annealing electrodeposited CISe have not produced material suitable for devices; secondary phases remain [2] and the absorber layers have been observed to melt in the high annealing temperatures [3]. In past work, we have shown that laser annealing coelectrodeposited precursors with a Nd:YAG, continuous wave (CW) laser (λ = 1064 nm) at powers from 50 -1000 Wcm -2 for 0.5 -60 s resulted in CISe absorber layers with evidence of improved crystallinity and optoelectronic properties over the precursor [4].…”
Section: Introductionmentioning
confidence: 99%
“…Replacing the furnace with a laser can reduce this annealing time by 2-3 orders of magnitude. However, previous attempts at laser annealing electrodeposited CISe have not produced material suitable for devices; secondary phases remain [2] and the absorber layers have been observed to melt in the high annealing temperatures [3]. In past work, we have shown that laser annealing coelectrodeposited precursors with a Nd:YAG, continuous wave (CW) laser (λ = 1064 nm) at powers from 50 -1000 Wcm -2 for 0.5 -60 s resulted in CISe absorber layers with evidence of improved crystallinity and optoelectronic properties over the precursor [4].…”
Section: Introductionmentioning
confidence: 99%
“…The difference in final crystallite size between the two methods is explained by localized melting occurring in the free standing films during annealing, where the absence of a substrate prevents thermal conductance away from the film. Bhattacharyya et al 70 extended this approach, keeping the same laser wavelength and dwell times but increasing the precursor thickness to 1.5 μm, which is suitable for photovoltaic devices. 71 Even with an increased film thickness and lower fluxes (<100 W cm −2 ) than in the CW experiments of Laude and Joliet, 68,69 a similar 0.5 to 1 μm grain size was measured in the final absorber.…”
Section: Annealing Of Cu/in/se Stacksmentioning
confidence: 99%
“…This contradicts Laude et al 68 who proposed a near-instantaneous (on the order of 10 −9 s), direct interatomic coupling reaction, facilitated by a liquid In-Se layer over the Se and the nanometer-scale film thickness. The peak temperature in the irradiated SEL precursor was postulated by Laude and modeled by Bhattacharyya to reach between 900°C and 1100°C, 70 which is sufficient to melt the In and Se layers and promote rapid reactions. However, these temperatures also exceed the vaporization temperature of Se, T vap : Se ¼ 685°C, 72 leading to Se loss, and are potentially above the melting temperature of CISe (990°C).…”
Section: Annealing Of Cu/in/se Stacksmentioning
confidence: 99%
See 2 more Smart Citations