Detection efficiency of time-of-flight energy elastic recoil detection analysis systems

Zhang, Yongfeng; Whitlow, Harry J.; Winzell, Thomas; Bubb, I.F.; Sajavaara, Timo; Arstila, Kai; Keinonen, J.

doi:10.1016/s0168-583x(98)00963-x

Cited by 159 publications

(77 citation statements)

References 39 publications

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“…The XPS analysis area was set to a diameter of energy elastic recoil detection analysis (ToF-E ERDA) was performed at the Uppsala Tandem Laboratory. We used 40 MeV 127 I 9+ projectile ions at 22.5º incident angle and a detector placed at a recoil scattering angle of 45º [17]. In order to correlate the nanostructuring and sp 2 /sp 3 ratio of the films to Ti concentration, Raman scattering spectroscopy was performed on the samples at room temperature in the range 800-1900 cm -1 in the back-scattering configuration using UV 325 nm laser excitation.…”

Section: Methodsmentioning

confidence: 99%

Control of crystallinity in sputtered Cr–Ti–C films

Furlan

Hultman

et al. 2013

Acta Materialia

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The influence of Ti content on crystallinity and bonding of Cr-Ti-C thin films deposited by magnetron sputtering have been studied by X-ray diffraction, X-ray photoelectron spectroscopy, transmission electron microscopy, and Raman spectroscopy. Our results show that binary Cr-C films without Ti exhibit an amorphous structure with two non-crystalline components;amorphous CrC x and amorphous C (a-C). The addition of 10-20 at% Ti leads to a crystallization of the amorphous CrC x and the formation of a metastable cubic (Cr 1-x Ti x )Cy phase. The observation was explained based on the tendency for formation of crystalline carbide films among the 3d transition metals. The mechanical properties of the films determined by nanoindentation and microindentation were found to be strongly dependent on the film composition in terms of hardness, elasticity modulus, H/E ratio, and crack development.

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Section: Methodsmentioning

confidence: 99%

Control of crystallinity in sputtered Cr–Ti–C films

Furlan

Hultman

et al. 2013

Acta Materialia

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“…The effect of the deposition conditions on the atomic composition of the films was determined by means time-of-flight elastic recoil detection analysis (ToF-ERDA) using a 40 MeV 127 I 9+ ion beam. A detailed description of the ToF-ERDA experimental set-up has been presented elsewhere [24]. Film thickness and as a consequence the deposition rate was determined by scanning electron microscopy (SEM) using a LEO 1550 Gemini.…”

Section: Methodsmentioning

confidence: 99%

Hysteresis and process stability in reactive high power impulse magnetron sputtering of metal oxides

et al. 2011

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In the further development of reactive sputter deposition, strategies which allow for stabilization of the transition zone between the metallic and compound modes, elimination of the process hysteresis, and increase of the deposition rate, are of particular interest. In this study, the hysteresis behavior and the characteristics of the transition zone during reactive high power impulse magnetron sputtering (HiPIMS) of Al and Ce targets in an Ar-O 2 atmosphere as a function of the pulsing frequency and the pumping speed are investigated.Comparison with reactive direct current magnetron sputtering (DCMS) reveals that HiPIMS allows for suppression/elimination of the hysteresis and a smoother transition from the metallic to the compound sputtering mode. For the experimental conditions employed in the present study, optimum behavior with respect to the hysteresis width is obtained at frequency values between 2 and 4 kHz, while HiPIMS processes with values below or above this range resemble the DCMS behavior. Al-O films are deposited using both HiPIMS and DCMS.Analysis of the film properties shows that elimination/suppression of the hysteresis in HiPIMS facilitates the growth of stoichiometric and transparent Al 2 O 3 at relatively high deposition rates over a wider range of experimental conditions as compared to DCMS.

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“…Time-of-flight energy elastic recoil detection analysis (ToF-E ERDA) measurements were performed using a 40 MeV 127 I 9+ ion beam at 67.5º incidence and 45º scattering angle [22]. The obtained data were evaluated with the CONTES code [23].…”

Section: Methodsmentioning

confidence: 99%

High-rate deposition of amorphous and nanocomposite Ti–Si–C multifunctional coatings

Lauridsen

Eklund

Joelsson

et al. 2010

Surface and Coatings Technology

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2 transport of the species. Increased target-to-substrate distance from 2 cm to 8 cm resulted in a higher carbon-to-titanium ratio in the coatings than for the Ti 3 SiC 2 compound target, due to different gas-phase scattering properties between the sputtered species. The coatings microstructure could be modified from nanocrystalline to predominantly amorphous by changing the pressure and target-to-substrate conditions to 4 mTorr and 2 cm, respectively. A decreased pressure from 10 mTorr to 4 or 2 mTorr at a target-tosubstrate distance of 2 cm decreased the deposition rate up to a factor of ~7 as explained by resputtering and an increase in the plasma sheath thickness. The coatings exhibited electrical resistivity in the range 160-800 µΩcm, contact resistance down to 0.8 mΩ at a contact force of 40 N, and nanoindentation hardness in the range 6-38 GPa.

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Detection efficiency of time-of-flight energy elastic recoil detection analysis systems

Cited by 159 publications

References 39 publications

Control of crystallinity in sputtered Cr–Ti–C films

Control of crystallinity in sputtered Cr–Ti–C films

Hysteresis and process stability in reactive high power impulse magnetron sputtering of metal oxides

High-rate deposition of amorphous and nanocomposite Ti–Si–C multifunctional coatings

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