Designing of low-cost, eco-friendly, and versatile photosensitive composites / inks based on carboxyl-terminated quantum dots and reactive prepolymers in a mixed solvent: Suppression of the coffee-ring strain and aggregation

Lee, Seonwoo

doi:10.1016/j.polymer.2019.121839

Cited by 6 publications

(3 citation statements)

References 53 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…In order to facilitate chemical compatibility between QDs and SU8, two conditions need to be fulfilled: (i) redispersion of QDs in the same solvent as SU8, namely, cyclopentanone and (ii) incorporation of the QD within the epoxy network by covalent coupling between the surface ligands and the epoxy groups from SU8, such that the QDs do not become sequestered as aggregates during the epoxy polymerization. Using ligand exchange with mercaptosuccinic acid, Lee demonstrated dispersion of QDs in SU8 at a macroscopic scale, but still with the presence of aggregates at the microscopic scale . We therefore synthesize a new QD surface ligand by reacting together cysteamine and SU8, so that the amine group reacts with one of the epoxy moieties on the SU8 and the thiol is available to bind to the QD surface (Figure ).…”

Section: Resultsmentioning

confidence: 99%

“…Using ligand exchange with mercaptosuccinic acid, Lee demonstrated dispersion of QDs in SU8 at a macroscopic scale, but still with the presence of aggregates at the microscopic scale. 34 We therefore synthesize a new QD surface ligand by reacting together cysteamine and SU8, so that the amine group reacts with one of the epoxy moieties on the SU8 and the thiol is available to bind to the QD surface (Figure 3). We select a cysteamine to SU8 ratio of 1:4, such that statistically one SU8 molecule can at most bind to one cysteamine, in order to avoid cross-linking the QDs together via SU8 bound to multiple cysteamines.…”

Section: Qd Dispersion In the Microcavitymentioning

confidence: 99%

“…Several methods have been developed for the dispersion of QDs inside WGM microcavities. The first strategy is the modification of the polymer surface. − However, this type of approach requires processing the polymeric cavity after its realization, which can induce roughness on the surface and greatly decrease the quality factor. ,− Another approach consists of functionalizing the polymeric material with fluorescent molecules . Bahrum et al.…”

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Photolithographed Whispering Gallery Mode Microdisk Cavities Coupled to Semiconductor Quantum Dots

Kersuzan,

Celaj,

Daney de Marcillac

et al. 2024

ACS Photonics

View full text Add to dashboard Cite

The development of whispering gallery mode (WGM) cavities as integrated light sources and sensors requires a scalable, low-cost fabrication of high-quality microcavities with integrated light sources. In particular, semiconductor quantum dots (QDs) are promising nanoemitters with highly desirable photostability and tunable optical properties, but their controlled coupling to polymeric microcavities is hampered by chemical incompatibility between the QD surface ligands and the high refractive index polymers used to fabricate microcavities. In this paper, we present a new type of polymeric WGM microdisk cavity realized by photolithography on an industrial photosensitive epoxy resin. We demonstrate the homogeneous labeling of these microcavities by CdSe/CdS/Zns QDs, thanks to a novel surface ligand and the coupling of their emission to WGMs from the microdisk cavity. The spectral properties of the WGM-coupled emission are consistent with electromagnetic simulations and indicate that the WGM quality factors can reach values higher than 6000. This demonstrates that the photolithography of high refractive epoxy resins followed by the integration of functionalized QDs enables the realization of well-controlled, high-quality WGM microresonators.

show abstract

Section: Resultsmentioning

confidence: 99%

Section: Qd Dispersion In the Microcavitymentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Photolithographed Whispering Gallery Mode Microdisk Cavities Coupled to Semiconductor Quantum Dots

Kersuzan,

Celaj,

Daney de Marcillac

et al. 2024

ACS Photonics

View full text Add to dashboard Cite

show abstract

Direct Photolithography Patterning of Quantum Dot‐Polymer

Guo,

Chen,

et al. 2023

Adv Funct Materials

View full text Add to dashboard Cite

For the new display technology based on quantum dots (QDs), achieving high‐precision red, green, and blue pixel arrays has always been a research focus in the pursuit of high‐quality and vivid image displays. However, problems such as material stability and process environment make it difficult to guarantee the quality of high‐precision patterns. The new optical patterning technology represented by direct photolithography is considered a highly promising method for achieving ultrafine patterns at the submicron level. This process prepares patterned quantum dot‐polymer films through light‐induced chemical changes. This paper reviews the progress of direct photolithography research focused on QD‐polymer materials and presents recent advances in such processes for monochromatic/multicolor light patterning. The article classifies QD‐polymers into three categories by combining QDs with polymers in different ways, including polymer‐coated QDs, polymers as QD ligands, and polymers as photocrosslinkers for QDs. Their synthesis schemes, functional features, and challenges are also presented. In addition, a scheme to remove the photomask during direct lithography using lasers and light field modulation is also proposed. It aims to provide readers and researchers with some generalized research information and improvement ideas. This can further advance the development of direct photolithography for QD‐polymers.

show abstract

Patterning Quantum Dots via Photolithography: A Review

et al. 2023

View full text Add to dashboard Cite

Pixelating patterns of red, green, and blue quantum dots (QDs) is a critical challenge for realizing high‐end displays with bright and vivid images for virtual, augmented, and mixed reality. Since QDs must be processed from a solution, their patterning process is completely different from the conventional techniques used in the organic light‐emitting diode and liquid crystal display industries. Although innovative QD patterning technologies are being developed, photopatterning based on the light‐induced chemical conversion of QD films is considered one of the most promising methods for forming micrometer‐scale QD patterns that satisfy the precision and fidelity required for commercialization. Moreover, the practical impact will be significant as it directly exploits mature photolithography technologies and facilities that are widely available in the semiconductor industry. This article reviews recent progress in the effort to form QD patterns via photolithography. The review begins with a general description of the photolithography process. Subsequently, different types of photolithographical methods applicable to QD patterning are introduced, followed by recent achievements using these methods in forming high‐resolution QD patterns. The paper also discusses prospects for future research directions.

show abstract

Designing of low-cost, eco-friendly, and versatile photosensitive composites / inks based on carboxyl-terminated quantum dots and reactive prepolymers in a mixed solvent: Suppression of the coffee-ring strain and aggregation

Cited by 6 publications

References 53 publications

Photolithographed Whispering Gallery Mode Microdisk Cavities Coupled to Semiconductor Quantum Dots

Photolithographed Whispering Gallery Mode Microdisk Cavities Coupled to Semiconductor Quantum Dots

Direct Photolithography Patterning of Quantum Dot‐Polymer

Patterning Quantum Dots via Photolithography: A Review

Contact Info

Product

Resources

About