2007
DOI: 10.1021/nn7001079
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Design of Reversible Cross-Linkers for Step and Flash Imprint Lithography Imprint Resists

Abstract: Progress in the semiconductor manufacturing industry depends upon continuous improvements in the resolution of lithographic patterning through innovative materials development and frequent retooling with expensive optics and radiation sources. Step and Flash Imprint Lithography is a low-cost, nanoimprint lithography process that generates nanopatterned polymeric films via the photopolymerization of low-viscosity solutions containing cross-linking monomers in a transparent template (mold). The highly cross-link… Show more

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Cited by 40 publications
(35 citation statements)
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“…Several cross-linkers derived from HEA had been considered ( 4 – 7 ; Figure 1b),and each of them could result in minimally swollen particles after the PRINT process. We opted for 7 , an acetal diacrylate (ADA), 3436 because the cross-linked particles could: 1) degrade quickly at pH = 3 to swell to the desired size (<3 h, compared to >24 h for 5 and >5 d for 6 ), shortening workup time; 2) stay minimally swollen without premature swelling (no obvious swelling in 3 d compared to Q = 4.1 after 6 h for 4 ) in phosphate buffered saline (PBS, pH = 7.4) for storage before further reactions were carried out.…”
Section: Resultsmentioning
confidence: 99%
“…Several cross-linkers derived from HEA had been considered ( 4 – 7 ; Figure 1b),and each of them could result in minimally swollen particles after the PRINT process. We opted for 7 , an acetal diacrylate (ADA), 3436 because the cross-linked particles could: 1) degrade quickly at pH = 3 to swell to the desired size (<3 h, compared to >24 h for 5 and >5 d for 6 ), shortening workup time; 2) stay minimally swollen without premature swelling (no obvious swelling in 3 d compared to Q = 4.1 after 6 h for 4 ) in phosphate buffered saline (PBS, pH = 7.4) for storage before further reactions were carried out.…”
Section: Resultsmentioning
confidence: 99%
“…Once fully polymerized, the thin film is insoluble in acetone due to the formation of highly cross-linked polymer network. An uncured or partially cured film would be stripped or destroyed by acetone [26]. …”
Section: Methodsmentioning
confidence: 99%
“…Renewable source-based monomers, such as furfural or furfuryl alcohol, can be prepared by hydrolysis and acid-dehydration conversion of polysaccharides, including hemicelluloses, cellulose abundant bagasse, and corncob [3,4]. Furan resins have been made using phenol or formaldehyde by aldehyde condensation in the presence of an acid or alkali [5,6].…”
Section: Introductionmentioning
confidence: 99%