Design of photoresists with reduced environmental impact. II. Water-soluble resists based on photocrosslinking of poly(2-isopropenyl-2-oxazoline)

Havard, Jennifer M.; Yoshida, Masahiro; Pasini, Dario; Vladimirov, Nikolay; Fréchet, Jean M. J.; Medeiros, David R.; Patterson, Kyle; Yamada, Shintaro; Willson, C. Grant; Byers, J. A.

doi:10.1002/(sici)1099-0518(19990501)37:9<1225::aid-pola2>3.0.co;2-5

Cited by 35 publications

(23 citation statements)

References 57 publications

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“…2‐Oxazoline monomers bearing unsaturated moieties are described with single (internal or terminal)98, 103, 110 or several double bonds such as 2‐isopropenyl‐2‐oxazoline,92 which polymerizes under free,111 controlled (reversible addition‐fragmentation chain transfer (RAFT)) radical processes,112 anionic, and cationic polymerizations 113. 2‐(9‐Decenyl)‐2‐oxazoline was modified by thiol‐ene coupling in the presence of 2‐mercaptoethanol giving polyols for polyurethane formulations 110.…”

Section: Functionalized Monomersmentioning

confidence: 99%

How to Modulate the Chemical Structure of Polyoxazolines by Appropriate Functionalization

Guillerm¹,

Monge²,

Lapinte³

et al. 2012

Macromol. Rapid Commun.

202

171

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Polyoxazolines (POx) are increasingly studied as polymeric building blocks due to the possibility of affording tunable properties. Additionally, as it was proved that biocompatibility and stealth behavior of POx are similar to that of poly(ethylene glycol) (PEG), it became challenging to develop polyoxazoline-based (co)polymers. Even if POx have a lot of advantages, they also show an important drawback as it is to date impossible to prepare high molecular weight polyoxazolines, with low polydispersity indexes. So, it appears important to judiciously functionalize them. This review covers the multiple ways of functionalization of polyoxazolines.The use of functional initiators, functional terminating agents, and 2-R-2-oxazolines with R functional side group is detailed. In conclusion, some perspectives on POxfunctionalizations are also reported, with functions permitting selective "click" reactions.

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Section: Functionalized Monomersmentioning

confidence: 99%

How to Modulate the Chemical Structure of Polyoxazolines by Appropriate Functionalization

Guillerm¹,

Monge²,

Lapinte³

et al. 2012

Macromol. Rapid Commun.

202

171

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“…27 In addition, there are water deposit, water develop photoresists that have recently been described. 28,29 In the studies reported here we have been able to demonstrate that as an added benefit these new PVD molecular glass photoresists are also developable in only deionized water.…”

Section: Resultsmentioning

confidence: 62%

Towards environmentally friendly, dry deposited, water developable molecular glass photoresists

Pfeiffer

Felix

Neuber

et al. 2008

Phys. Chem. Chem. Phys.

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Photoresists based on molecular glasses are gaining more and more importance as resist material to replace polymer based photoresist. In addition environmental issues have to be considered in the long-term. Therefore the paper describes novel negative photoresists containing a ternary mixture of a glassy low molecular functional polyphenol where the film preparation is possible by solvent-free physical vapor deposition. After UV light exposure and a thermal annealing process to enable acid catalyzed crosslinking between the molecular glass and the crosslinker, the photoresist was developed using only water to give well-defined patterns. In order to experimentally study efficiently the multiple parameters such as composition, exposure dose, and development times combinatorial PVD techniques were utilized.

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“…PVA‐based resist [ 117 ] reported by Wilson's group with (2,4‐dihydroxyphenyl)dimethylsulfonium triflate as a photoacid generator is another successful example of the same strategy. Subsequent development included a photoresist based [ 118 ] on poly(2‐isopropenyl‐2‐oxazoline) or poly(2‐isopropenyl‐2‐oxazoline‐co‐styrene) allowed to improve the patterning resolution. The latest negative tone resist [ 119 ] with reduced environmental impact is based on poly(1,2:5,6‐di‐O‐isopropylidene‐3‐O‐methacryloyl‐α‐d‐glucofuranose) demonstrated the resolution of about 0.2 µm at 30 mJ cm −2 .…”

Section: Patterning Approachesmentioning

confidence: 99%

Gentle Patterning Approaches toward Compatibility with Bio‐Organic Materials and Their Environmental Aspects

Grebenko

Motovilov

Bubis

et al. 2022

Small

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Advances in material science, bio-electronic, and implantable medicine combined with recent requests for eco-friendly materials and technologies inevitably formulate new challenges for nano-and micro-patterning techniques. Overall, the importance of creating micro and nanostructures is motivated by a large manifold of fundamental and applied properties accessible only at the nanoscale. Lithography is a crucial family of fabrication methods to create prototypes and produce devices on an industrial scale. The pure trend in the miniaturization of critical electronic semiconducting components is recently enhanced by implementing bio-organic systems in electronics. So far, significant efforts have been made to find novel lithographic approaches and develop old ones to reach compatibility with delicate bio-organic systems and minimize the impact on the environment. Herein, we briefly review such delicate materials and sophisticated patterning techniques.

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Design of photoresists with reduced environmental impact. II. Water-soluble resists based on photocrosslinking of poly(2-isopropenyl-2-oxazoline)

Cited by 35 publications

References 57 publications

How to Modulate the Chemical Structure of Polyoxazolines by Appropriate Functionalization

How to Modulate the Chemical Structure of Polyoxazolines by Appropriate Functionalization

Towards environmentally friendly, dry deposited, water developable molecular glass photoresists

Gentle Patterning Approaches toward Compatibility with Bio‐Organic Materials and Their Environmental Aspects

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