2004
DOI: 10.1021/bk-2004-0874.ch014
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Design of Nanoporous Polyarylene Polymers for Use as Low-k Dielectrics in Microelectronic Devices

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Cited by 4 publications
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“…With SiLK™ from The Dow Chemical Company there is already an insulating material based on a polyphenylene structure with a dielectric constant of 2.65 commercially available 9. A further decrease in the dielectric constant can be achieved preparing an organic nanoporous structure from a thermally stable matrix and a porogen;11 the dielectric constant of the polyphenylene SiLK™ for example was reduced to a value of 2.3 with a star‐shaped polystyrene as porogen 12. Concerning this approach, hyperbranched polyphenylenes seem to be very promising as a matrix material since firstly, they should exhibit low dielectric constants due to their branched and twisted unpolar all‐phenylene structure,13 and secondly, due to the branching a high solubility and a miscibility with porogens can be expected.…”
Section: Introductionmentioning
confidence: 99%
“…With SiLK™ from The Dow Chemical Company there is already an insulating material based on a polyphenylene structure with a dielectric constant of 2.65 commercially available 9. A further decrease in the dielectric constant can be achieved preparing an organic nanoporous structure from a thermally stable matrix and a porogen;11 the dielectric constant of the polyphenylene SiLK™ for example was reduced to a value of 2.3 with a star‐shaped polystyrene as porogen 12. Concerning this approach, hyperbranched polyphenylenes seem to be very promising as a matrix material since firstly, they should exhibit low dielectric constants due to their branched and twisted unpolar all‐phenylene structure,13 and secondly, due to the branching a high solubility and a miscibility with porogens can be expected.…”
Section: Introductionmentioning
confidence: 99%