1980
DOI: 10.1002/j.1538-7305.1980.tb03004.x
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Design of Bubble Device Elements Employing Ion-Implanted Propagation Patterns

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Cited by 32 publications
(1 citation statement)
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“…The existence of the charged walls, shown in figure 12, explains why the bubble domain can be held and propagated so well by an ion-implanted pattern. Good devices were soon being made using these patterns (Lin et al 1977, Nelson et al 1980 even though the exact origin of the easy direction of magnetisation, which appears around the circumference of the track, was still obscure. A possible solution to this problem was suggested independently by Backera et ai (1980) and Hidaka and Matsutera (1981) who considered the implications of the way the stress in the ion-implanted layer would have to vary in order to satisfy the elastic boundary conditions at the edge of the implanted region.…”
Section: Propagation Tracks Made By Means Of Ion Implantationmentioning
confidence: 99%
“…The existence of the charged walls, shown in figure 12, explains why the bubble domain can be held and propagated so well by an ion-implanted pattern. Good devices were soon being made using these patterns (Lin et al 1977, Nelson et al 1980 even though the exact origin of the easy direction of magnetisation, which appears around the circumference of the track, was still obscure. A possible solution to this problem was suggested independently by Backera et ai (1980) and Hidaka and Matsutera (1981) who considered the implications of the way the stress in the ion-implanted layer would have to vary in order to satisfy the elastic boundary conditions at the edge of the implanted region.…”
Section: Propagation Tracks Made By Means Of Ion Implantationmentioning
confidence: 99%