Design, manufacturing and testing of gratings for synchrotron radiation

Nelles, B.; Heidemann, Klaus; Kleemann, Bernd H.

doi:10.1016/s0168-9002(01)00294-7

Cited by 12 publications

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“…State-of-the-art gratings of laminar as well as of blazed groove profile are etched into the grating substrate of single-crystal silicon by use of IBE (Albert et al, 1994;Nelles et al, 2001). In a first approach we investigated the etching process for blazed gratings with a Kaufman source at the Leibniz Institut fü r Oberflä chenmodifizierung (IOM) in Leipzig.…”

Section: The Final Groove Profile: Ibe Of the Gratingmentioning

confidence: 99%

“…A special case is the variable-line-spacing (VLS) grating where a dedicated groove density variation in one or two dimensions is defined by a higher-order polynomial (Harada et al, 1984;Reininger, 2011). The manufacture of such optical components which have a laminar or a blazed groove profile requires a complex nano-technological process line including ultra-precise metrology, a groove-shaping process of utmost precision as well as ion beam etching (IBE) to etch the final groove profile into the substrate (Nelles et al, 2001). Such gratings are usually processed on substrates of quartz glass or single-crystal silicon.…”

Section: Introductionmentioning

confidence: 99%

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Gratings for synchrotron and FEL beamlines: a project for the manufacture of ultra-precise gratings at Helmholtz Zentrum Berlin

et al. 2018

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Blazed gratings are of dedicated interest for the monochromatization of synchrotron radiation when a high photon flux is required, such as, for example, in resonant inelastic X-ray scattering experiments or when the use of laminar gratings is excluded due to too high flux densities and expected damage, for example at free-electron laser beamlines. Their availability became a bottleneck since the decommissioning of the grating manufacture facility at Carl Zeiss in Oberkochen.To resolve this situation a new technological laboratory was established at the Helmholtz Zentrum Berlin, including instrumentation from Carl Zeiss. Besides the upgraded ZEISS equipment, an advanced grating production line has been developed, including a new ultra-precise ruling machine, ion etching technology as well as laser interference lithography. While the old ZEISS ruling machine GTM-6 allows ruling for a grating length up to 170 mm, the new GTM-24 will have the capacity for 600 mm (24 inch) gratings with groove densities between 50 lines mm À1 and 1200 lines mm À1. A new ion etching machine with a scanning radiofrequency excited ion beam (HF) source allows gratings to be etched into substrates of up to 500 mm length. For a final at-wavelength characterization, a new reflectometer at a new Optics beamline at the BESSY-II storage ring is under operation. This paper reports on the status of the grating fabrication, the measured quality of fabricated items by ex situ and in situ metrology, and future development goals.

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Section: The Final Groove Profile: Ibe Of the Gratingmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Gratings for synchrotron and FEL beamlines: a project for the manufacture of ultra-precise gratings at Helmholtz Zentrum Berlin

et al. 2018

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“…This process defines the groove density of 1123 lines mm À1 but not the final blaze profile. Finally, the ruled pattern has been transferred to the silicon substrate by ion beam treatment (Nelles et al, 2001). This process allows for excellent control of the desired blaze angle and in addition an improvement of the final microroughness on the grooves (Heidemann et al, 2007).…”

Section: Samplesmentioning

confidence: 99%

Damage thresholds for blaze diffraction gratings and grazing incidence optics at an X-ray free-electron laser

Krzywiński

Conley

Moeller

et al. 2018

J Synchrotron Radiat

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The Linac Coherent Light Source is upgrading its machine to high repetition rate and to extended ranges. Novel coatings, with limited surface oxidation, which are able to work at the carbon edge, are required. In addition, highresolution soft X-ray monochromators become necessary. One of the big challenges is to design the mirror geometry and the grating profile to have high reflectivity (or efficiency) and at the same time survive the high peak energy of the free-electron laser pulses. For these reasons the experimental damage threshold, at 900 eV, of two platinum-coated gratings with different blazed angles has been investigated. The gratings were tested at 1 grazing incidence. To validate a model for which the damage threshold on the blaze grating can be estimated by calculating the damage threshold of a mirror with an angle of incidence identical to the angle of incidence on the grating plus the blaze angle, tests on Pt-coated substrates have also been performed. The results confirmed the prediction. Uncoated silicon, platinum and SiB 3 (both deposited on a silicon substrate) were also investigated. In general, the measured damage threshold at grazing incidence is higher than that calculated under the assumption that there is no energy transport from the volume where the photons are absorbed. However, it was found that, for the case of the SiB 3 coating, the grazing incidence condition did not increase the damage threshold, indicating that the energy transport away from the extinction volume is negligible.

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“…The ruling of such gratings is performed on a gold-film by soft plastic deformation with a boat bottom shaped diamond. Taking advance from the different etching rates of gold and silicon for different etchgases like Ar or Xe, the final blaze angle is realized by ion-etching [22]. This technique allows transferring the blaze profile into the Si-substrate and enables an effective blaze angle reduction by a factor up to 10.…”

Section: The Grating Project At the Hzbmentioning

confidence: 99%

Metrology, Mirrors and Gratings – Advances and Challenges in Synchrotron Optics

Siewert

2013

J. Phys.: Conf. Ser.

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Abstract. Ultra-precise reflective and diffractive optical elements like blazed diffraction gratings or ultra-precise mirrors of flat, elliptic, parabolic, or other shapes have become key components in today's synchrotron optics. These optical components feature nanometre accuracy on a macroscopic length scale. Beamlines with extreme lengths of 100m to 1km or more (as planned for the European XFEL) will require plane mirrors characterized by a residual slope error of 50nrad rms and a curvature radius of > 1000km on a length of 800mm or even more. Diffraction limited focusing mirrors for hard X-ray application show residual slope deviations of 50nrad rms on a length of 350mm. The current slope limit for focusing mirrors in VUV-application lies at around 0.5µrad rms, one order of magnitude inferior compared to hard X-ray focusing optics, and it can still not be exceeded due to technological restrictions. The requirements for diffraction gratings are even more challenging. In addition to the challenges posed by perfect substrate quality, special attention is needed to guaranty a precise positioning of the grooves along the full aperture length. A positioning accuracy of about 20nm for the carriage system of a ruling engine is mandatory to meet the Marechal tolerance for gratings. For the manufacture of blazed and laminar gratings, we are currently establishing a new technological laboratory at the Helmholtz Zentrum Berlin (HZB), including instrumentation from Carl Zeiss. Besides the present Zeiss technology, we are also developing an advanced technology line, including a new ultra-precise ruling machine, ion etching technology as well as laser holography.

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Design, manufacturing and testing of gratings for synchrotron radiation

Cited by 12 publications

References 0 publications

Gratings for synchrotron and FEL beamlines: a project for the manufacture of ultra-precise gratings at Helmholtz Zentrum Berlin

Gratings for synchrotron and FEL beamlines: a project for the manufacture of ultra-precise gratings at Helmholtz Zentrum Berlin

Damage thresholds for blaze diffraction gratings and grazing incidence optics at an X-ray free-electron laser

Metrology, Mirrors and Gratings – Advances and Challenges in Synchrotron Optics

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