Abstract:We report the technology for the design, fabrication and testing of polysilicon microheaters in silicon using a standard 2 m n-well CMOS technology. The polysilicon microheaters are realized in two steps : layout design for CMOS process and post processing etching. An additional layer in CMOS technology called "open" was incorporated. The "open" layer creates a direct opening to the substrate. Post processing is done on the fabricated CMOS chips using isotropic etchant like xenon diflouride (XeF2) or anisotrop… Show more
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