Design and fabrication of an L-type waveguide megasonic system for cleaning of nano-scale patterns

Kim, Hyunse; Lee, Yanglae; Lim, Euisu

doi:10.1016/j.cap.2008.12.058

Cited by 18 publications

(7 citation statements)

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“…진동자는 압전소자들을 여러 개 묶어 제작하는데 금속 시편에 직접 타격하기 위해 티타늄 재질을 사용하였다. 먼저, 웨이브가이드의 설계는소재의성분이나 구조에따라 주파수와진동 손실이 달라지므로 반복하여 수정 가공을 하였다 [9][10][11][12] . 웨이브가이드 의 압전소자부분을감싸고 있는케이스는 진동이 없는 노드 부분에 연결하여완성된웨이브가이드의주파수에영향이없도록하였다.…”

Section: 서 론unclassified

Development of 20-kHz Ultrasonic Equipment for UNSM

Shin¹,

Kim²,

Lim³

2015

Journal of the Korean Society of Manufacturing Technology Engin

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ARTICLE INFO ABSTRACTArticle history:Ultrasonic nanocrystal surface modification (UNSM) is an example of a nanoscale-surface modification that has become noticeable because of its effects on the mechanical improvement of metallic materials. UNSM equipment needs to be both utilized and improved. The equipment is based on an ultrasonic waveguide whose role is to strike surfaces of metallic materials to achieve nanoscale deformation. In this paper, we introduce the development of one kind of UNSM equipment. Using piezoelectric elements, we repeatedly design and fabricate a 20-kHz ultrasonic waveguide. With respect to the composition of the equipment, the waveguide is automatically transferred by two axial stages automatically. In addition, a static force is constantly applied by pneumatic devices. We perform an experiment to verify the feasibility of the equipment.

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Section: 서 론unclassified

Development of 20-kHz Ultrasonic Equipment for UNSM

Shin¹,

Kim²,

Lim³

2015

Journal of the Korean Society of Manufacturing Technology Engin

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“…Single-wafer megasonic systems have been proposed for these reasons and they are regarded as one of major potential cleaning tools (3)(4)(5)(6). In megasonic cleaning, physical forces from a vibrating piezoelectric actuator are acting on contaminated particles with chemical activity in sub-micron size range (7).…”

Section: Introductionmentioning

confidence: 99%

A Multi-Frequency Megasonic System for Nano-Particle Removal

Kim¹,

Lee²,

Lim³

2013

ECS Trans.

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A multi-frequency megasonic system for nano-particle removal was developed. In design process, finite element analysis was performed and anti-resonance frequency for 1 MHz actuating, was predicted as 995 kHz with 0.5% error compared with the measured value of 1000 kHz. In addition, anti-resonance frequency of 2998 kHz was obtained for 3 MHz, which coincided with the measured value. For the verification of the system performance, acoustic pressures of the developed waveguide were measured and compared with a commercial megasonic system. The result revealed that the developed one can show relatively better distributions. To assess cleaning ability, particle removal efficiency (PRE) tests were processed and 56.1% PRE improvement was achieved compared with a conventional product. Considering these results, the developed system can be applied to nano-particle cleaning process with higher efficiency.

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“…To satisfy these industrial demands, single-wafer megasonic systems have been proposed, and already adopted in semiconductor manufacturing fields (3,4). The megasonic system can remove small particles using mechanical forces with chemicals in the sub-micron size range (5).…”

Section: Introductionmentioning

confidence: 99%

Design, Fabrication, and Performance Test of a Quartz Horn Megasonic Waveguide for Semiconductor Cleaning

2011

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A quartz horn megasonic waveguide for semiconductor cleaning was developed. Design and fabrication processes with a performance test are explained. A finite element analysis was performed using ANSYS for the design process. The predicted anti-resonance frequency of the quartz waveguide with a lead zirconate titanate (PZT) actuator was 1002 kHz, which agreed well with the measured value of 1003 kHz. Using this analysis results, the waveguide was fabricated with quartz. To assess the system performance, acoustic pressures were measured. The results of measurement showed well-distributed acoustic pressure output. Finally, preliminary particle removal efficiency (PRE) tests were carried out with different input powers between 0.5 W and 7 W. The number of particles was counted using a particle counting machine, and over 90% particles was removed with more than 1 W power supply. These results suggest that the developed quartz horn megasonic system can be used for semiconductor cleaning process.

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Design and fabrication of an L-type waveguide megasonic system for cleaning of nano-scale patterns

Cited by 18 publications

References 0 publications

Development of 20-kHz Ultrasonic Equipment for UNSM

Development of 20-kHz Ultrasonic Equipment for UNSM

A Multi-Frequency Megasonic System for Nano-Particle Removal

Design, Fabrication, and Performance Test of a Quartz Horn Megasonic Waveguide for Semiconductor Cleaning

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