Design and Fabrication of a Horn-Type Megasonic Waveguide for Nanoparticle Cleaning

Kim, Hyunse; Lee, Yanglae; Lim, Euisu

doi:10.1109/tsm.2013.2238563

Cited by 10 publications

(5 citation statements)

References 9 publications

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“…Furthermore, the radiation pressure (

) induced by bubbles oscillation is one of the essential physical mechanisms for the bubble-driven particle motion in the abrasive phenomenon, which causes serious cavitation damage to the surface of hydraulic machinery [47] . In addition, radiation pressure is also an important mechanism for bubbles to remove pollutant particles in ultrasonic cleaning [12] , [13] , [14] , [15] . Therefore, it is necessary to carefully investigate the prediction accuracy of

.…”

Section: Free Oscillating Bubble In Liquidsmentioning

confidence: 99%

“…Therefore, the compressibility effect is significant, which will lead to a large difference between the first-order and the second-order equations. Furthermore,

and

are essential for the investigations of the physical mechanism of practical applications, such as the cavitation damage [47] and the ultrasonic cleaning [12] , [13] , [14] , [15] . Therefore, when the bubble wall Mach number is high, the second-order equation should be safely selected for simulations due to its high accuracy.…”

Section: Influences Of the Initial Bubble Radiusmentioning

confidence: 99%

“…Bubble dynamics is widely existing in contemporary science and technology (e.g. cavitation erosion in hydraulic machinery [1] , [2] , underwater explosion [3] , [4] , [5] , biomedical applications [6] , [7] , [8] , [9] , [10] , [11] , ultrasonic cleaning [12] , [13] , [14] , [15] and sonochemistry [16] , [17] , [18] , [19] ). The violent expansion and collapse of bubbles play an important role in the applications of bubble dynamics.…”

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

A single oscillating bubble in liquids with high Mach number

Zheng

Wang

Zhang

2022

Ultrasonics Sonochemistry

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“…Furthermore, the radiation pressure (

.…”

Section: Free Oscillating Bubble In Liquidsmentioning

confidence: 99%

“…Therefore, the compressibility effect is significant, which will lead to a large difference between the first-order and the second-order equations. Furthermore,

and

Section: Influences Of the Initial Bubble Radiusmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

A single oscillating bubble in liquids with high Mach number

Zheng

Wang

Zhang

2022

Ultrasonics Sonochemistry

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“…Particulate residue is a major concern in IC, both owing to yield loss and owing to the failure to control defects; this limits product performance for the manufacturing of semiconductors [1]. However, through chemical solutions aided by sound fields (in the MHz range), particle removal can generally be achieved [2].…”

Section: Introductionmentioning

confidence: 99%

The suitability of ultrasonic and megasonic cleaning of nanoscale patterns in ammonia hydroxide solutions for particle removal and feature damage

Chu

Fuh

2020

Semicond. Sci. Technol.

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In this study, usually, arrays of square or rectangular piezo devices bonded to a substrate and spaced as close together as possible for transduction for efficient megasonic cleaning, megasonic cleaning is applied to removing sidewall particles during post-silicon etch cleaning. A system was developed containing different measures of ultrasonic and megasonic processes, generated by adjusting the power in NH4OH. Megasonic waves in the gap between the wafer and the megasonic transducer ensure uniform sonic energy across the whole wafer. The generation of radicals is promoted by megasonic energy, such that residue removal occurs in dilute solution. The feature damage for the megasonic cleaning decreased in the NH4OH solution compared to ultrasonic. Moreover, the mechanical force of the bubble cavitation generated by megasonic cleaning also improves residue removal and enhances the mass transfer rate. Extreme cavitation is beneficial for removing particles but can damage wafer features. The damage caused by ultrasonic cleaning is significantly larger than megasonic cleaning. Compared with typical methods of silicon oxide residues removal, this megasonic process has a low material loss and a high residue removal efficiency for via, with a high aspect ratio. In addition, it minimizes defects to structures. These results suggest that megasonic cleaning can be applied to the nanoparticle cleaning process. Megasonic cleaning is quickly becoming an efficient method for post process cleaning in IC fabrication processes.

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“…Single-wafer megasonic systems have been proposed for these reasons and they are regarded as one of major potential cleaning tools (3)(4)(5)(6). In megasonic cleaning, physical forces from a vibrating piezoelectric actuator are acting on contaminated particles with chemical activity in sub-micron size range (7).…”

Section: Introductionmentioning

confidence: 99%

A Multi-Frequency Megasonic System for Nano-Particle Removal

Kim¹,

Lee²,

Lim³

2013

ECS Trans.

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A multi-frequency megasonic system for nano-particle removal was developed. In design process, finite element analysis was performed and anti-resonance frequency for 1 MHz actuating, was predicted as 995 kHz with 0.5% error compared with the measured value of 1000 kHz. In addition, anti-resonance frequency of 2998 kHz was obtained for 3 MHz, which coincided with the measured value. For the verification of the system performance, acoustic pressures of the developed waveguide were measured and compared with a commercial megasonic system. The result revealed that the developed one can show relatively better distributions. To assess cleaning ability, particle removal efficiency (PRE) tests were processed and 56.1% PRE improvement was achieved compared with a conventional product. Considering these results, the developed system can be applied to nano-particle cleaning process with higher efficiency.

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Design and Fabrication of a Horn-Type Megasonic Waveguide for Nanoparticle Cleaning

Cited by 10 publications

References 9 publications

A single oscillating bubble in liquids with high Mach number

A single oscillating bubble in liquids with high Mach number

The suitability of ultrasonic and megasonic cleaning of nanoscale patterns in ammonia hydroxide solutions for particle removal and feature damage

A Multi-Frequency Megasonic System for Nano-Particle Removal

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