Design and analysis on kinematics of the lap-polisher with planet movement for optical fiber end-face

Abstract

In order to obtain the effects of the kinematical state on the profile precision of the fiber-optic end-face in the process of lapping and polishing, a kinematical equation of the lap-polisher with planet movement is developed. Based on these equations and the tribological model of CMP, the dimensionless distribution of the material removal volume (DDMRV) and the trajectories of abrasive grains cutting on the lap-polisher are numerically simulated with the way of stochastic abrasive grains. Then, the effects of the parameters of the lap-polisher on the uniformity of the DDMRV and the trajectory on the optical fiber end surface are discussed, and the results are that the DDMRV and the trajectory of abrasive grains have a rather better value when the length L of the planet carrier and the rotational speed n 1 of the ring gear are increased and the rotation speed n H of the planet carrier is chosen in an advisable parameter region.

Analysis of Abrasive Particle Trajectories during Single-Sided Lapping Process with Driven Conditioning Ring

“…A wear of tool can be controlled by choosing appropriate kinematical parameters. Detailed analysis of path types in lapping process, which were already mentioned in previous researches [8,9] are shown below. In order to analyse kinematic systems, an additional parameter must be defined:…”

“…However, in order to ensure the constant profile wear a kinematic system can be changed. Providing the additional movements of the conditioning rings may affect the profile wear on lapping plate [5,7,8,11,12].…”