The continuous down-scaling of MOSFETs gives faster and more complex chip design. As the devices scale down, supply voltage should be decreased accordingly. However the reduction in power consumption of MOSFETs is becoming increasingly difficult. The reduction of MOSFET size causes high sub-threshold swing, leakage current (I off ) and short channel effect. In this paper Tunnel FET (TFET) is studied as alternative device which could overcome physical limits of MOSTETs. TFET is simply a gated p-i-n diode. TFET works on the principle of band to band tunnelling. TFETs do not suffer from short channel effect and it has small sub-threshold swing and low off current. This paper introduces and summarizes progress in the development of the tunnel field-effect transistors relative to the metal-oxidesemiconductor field-effect transistor, design trade-offs, and fundamental challenges.