Deposition of titanium dioxide from TTIP by plasma enhanced and remote plasma enhanced chemical vapor deposition

Recent Developments in Environmental Photocatalytic Degradation of Organic Pollutants: The Case of Titanium Dioxide Nanoparticles—A Review

“…This process alters the mechanical, electrical, thermal, optical, corrosion resistance, and wear-resistance properties of various substrates [163]. CVD has been used to form free-standing bodies, films, and fibres and to infiltrate fabric to form composite materials and, recently, in the fabrication of various nanomaterials [164,165]. Chemical vapour deposition of titanium dioxide is usually carried out through the reaction of titanium tetrachloride (TiCl 4 ) with oxygen or through the thermal reaction of a titanium alkoxide such as Ti(OPri) 4 , which already displays the Ti-O 4 tetrahedral motif of the titanium dioxide lattice in its chemical structure [165][166][167].…”

“…In CVD processes, the gaseous precursor compounds chemically react on a heated substrate surface and the deposition reaction is driven by thermal energy. The reactions usually happen in an inert atmosphere in the presence of a gas, for example, N 2 , Ar, or He [163][164][165]167]. Moreover, the reaction conditions in a CVD process can be tuned to determine the phase, size, and morphology of the TiO 2 nanostructures.…”

“…To synthesise TiO 2 thin films by CVD, either a titanium alkoxide such as titanium isopropoxide (TTIP) is used, which already has the Ti-O 4 tetrahedral motif of the TiO 2 in its chemical structure, or TiCl 4 is reacted with oxygen to form the T-O 4 tetrahedral motif. These are thereafter deposited on a substrate at elevated temperatures in a vacuum to form the titania thin films [165,236,268,269]. CVD offers good control of film structure and composition, excellent uniformity even on highly irregular substrates (conformal deposition), and a sufficiently high growth rate thus applicable for synthesis of multilayer structures [268,[270][271][272].…”

A Supersonic Plasma Jet Source for Controlled and Efficient Thin Film Deposition

“…Although promising, no examples of nano-assembled functional films have been demonstrated so far. Moreover, there are very few examples of plasma processes capable of depositing nanostructured films with controlled chemistry, morphology and porosity [12]. The novelty of the proposed approach, which we denominated Plasma Assisted Supersonic Jet Deposition (PA-SJD), is the segmentation of the gas phase material synthesis in two separate steps: chemistry control in a reactive cold plasma environment; nucleation and assembling control by means of a supersonic inseminated jet over a substrate.…”

A new method for deposition nitrogen-doped TiO2 nanofibers with mixed phases of anatase and rutile

“…So it can deposit TiO 2 films on the substrates without the limitation to the sizes and complexity of geometries. The results of structural analysis had showed that the TiO 2 films were amorphous structure or low crystallinity . Meantime, the TiO 2 films have the wide band gap.…”