Deposition of Silver Thin Films Using the Pyrazolate Complex [Ag(3,5‐(CF₃)₂C₃HN₂)]₃

Abstract

The synthesis and characterization of a series of silver pyrazolate complexes [Ag(tfpz)] 3 (1), [Ag(fbpz)] 3 (2), [Ag(dbpz)] 3 (3), and [(py)Ag(tfpz)] 2 (4) are reported, for which tfpz, fbpz, dbpz are abbreviations for the pyrazolate ligands with formulae 3,5-(CF 3 ) 2 -pz, 3-t Bu-5-(CF 3 )-pz, and 3,5-( t Bu) 2 -pz, respectively. These silver complexes were characterized by microanalysis and spectroscopic methods. The CF 3 -substituted complex 1 possesses the highest volatility and stability against thermal decomposition. Low pressure CVD experiments were conducted over the temperature range 250±350 C. Silver metal thin films were successfully obtained on silicon wafers using pure H 2 as the carrier gas. Scanning electron microscopy (SEM) was used to reveal surface morphologies, while X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD) were utilized to determine the atomic composition of the as-deposited thin films as well as the crystallite packing.

Metal-based Inkjet Inks for Printed Electronics

“…The synthesis of Cu(I) and Ag(I) metal organic complexes is commonly achieved by reacting a transition metal salt with the desired oxidation state with a combination of an anionic ligand and a -donor ligand in a one-pot reaction followed by purification [163][164][165][166][167][168][169][170][171][172][173][174][175][176][177][178]. Similarly, Cu(II) MC precursors are obtained in an analogous manner from Cu(II) salts [179][180][181][182].…”

Radical‐Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine‐Adducted Silver Carboxylates

“…According to the literature, the thermally most stable and sufficiently volatile silver compounds used for CVD of silver seem to be phosphine-adducted carboxylates, pyrazolates, and b-diketonates. [40][41][42] Of these, Ag(O 2 C t Bu)(PEt 3 ) and Ag(O 2 C t Bu)(PBu 3 ) provide a ref-…”

Silver(I) Bis(pyrazolyl)methane Complexes and Their Implementation as Precursors for Metallic Silver Deposition

“…Many silver complexes have been investigated as suitable precursors for the deposition of silver metal on metallic substrates, but only few show air and moisture stability and decomposition temperatures suitable for a convenient annealing. It was also found that, in some cases, the silver deposition that occurs by CVD may require the stabilization of the precursor by appropriate fictionalization of the ligand …”